Invention Application
- Patent Title: LIGHT EMITTING DIODE AND FABRICATION METHOD THEREOF
- Patent Title (中): 发光二极管及其制造方法
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Application No.: US13323327Application Date: 2011-12-12
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Publication No.: US20120193663A1Publication Date: 2012-08-02
- Inventor: Chia-En LEE
- Applicant: Chia-En LEE
- Applicant Address: TW Hsinchu
- Assignee: LEXTAR ELECTRONICS CORP.
- Current Assignee: LEXTAR ELECTRONICS CORP.
- Current Assignee Address: TW Hsinchu
- Priority: TW100103999 20110201
- Main IPC: H01L33/60
- IPC: H01L33/60

Abstract:
A fabrication method of a light-emitting diode including forming an epitaxial layer on a first substrate; forming a metal pad and a stress release ring on the epitaxial layer, wherein the stress release ring surrounds the metal pad; performing a substrate replacement process to transfer the epitaxial layer, the metal pad, and the stress release ring onto a second substrate, wherein the metal pad and the stress release ring are disposed between the epitaxial layer and the second substrate; patterning the epitaxial layer to expose a portion of the stress release ring; and removing the stress release ring to suspend a portion of the epitaxial layer. Moreover, a light emitting diode is provided.
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