发明申请
- 专利标题: Method for Growth of Indium-Containing Nitride Films
- 专利标题(中): 含铟氮化物膜生长方法
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申请号: US13346507申请日: 2012-01-09
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公开(公告)号: US20120199952A1公开(公告)日: 2012-08-09
- 发明人: Mark P. D'Evelyn , Christiane Poblenz , Michael R. Krames
- 申请人: Mark P. D'Evelyn , Christiane Poblenz , Michael R. Krames
- 申请人地址: US CA Goleta
- 专利权人: Soraa, Inc.
- 当前专利权人: Soraa, Inc.
- 当前专利权人地址: US CA Goleta
- 主分类号: H01L29/20
- IPC分类号: H01L29/20 ; H01L21/20
摘要:
A method for growth of indium-containing nitride films is described, particularly a method for fabricating a gallium, indium, and nitrogen containing material. On a substrate having a surface region a material having a first indium-rich concentration is formed, followed by a second thickness of material having a first indium-poor concentration. Then a third thickness of material having a second indium-rich concentration is added to form a sandwiched structure which is thermally processed to cause formation of well-crystallized, relaxed material within a vicinity of a surface region of the sandwich structure.
公开/授权文献
- US08482104B2 Method for growth of indium-containing nitride films 公开/授权日:2013-07-09
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