发明申请
- 专利标题： TUNABLE GROUND PLANES IN PLASMA CHAMBERS
- 专利标题（中）： 等离子体燃烧室中的接地平台
-
申请号： US13456308申请日： 2012-04-26
-
公开(公告)号： US20120205046A1公开(公告)日： 2012-08-16
- 发明人: Karthik Janakiraman , Thomas Nowak , Juan Carlos Rocha-Alvarez , Mark A. Fodor , Dale R. Du Bois , Amit Bansal , Mohamad A. Ayoub , Eller Y. Juco , Visweswaren Sivaramakrishnan , Hichem M'Saad
- 申请人： Karthik Janakiraman , Thomas Nowak , Juan Carlos Rocha-Alvarez , Mark A. Fodor , Dale R. Du Bois , Amit Bansal , Mohamad A. Ayoub , Eller Y. Juco , Visweswaren Sivaramakrishnan , Hichem M'Saad
- 申请人地址： US CA Santa Clara
- 专利权人： APPLIED MATERIALS, INC.
- 当前专利权人： APPLIED MATERIALS, INC.
- 当前专利权人地址： US CA Santa Clara
- 主分类号： H01L21/3065
- IPC分类号： H01L21/3065
摘要：
An apparatus and method are provided for controlling the intensity and distribution of a plasma discharge in a plasma chamber. In one embodiment, a shaped electrode is embedded in a substrate support to provide an electric field with radial and axial components inside the chamber. In another embodiment, the face plate electrode of the showerhead assembly is divided into zones by isolators, enabling different voltages to be applied to the different zones. Additionally, one or more electrodes may be embedded in the chamber side walls.
信息查询
IPC分类:
