Invention Application
- Patent Title: Pattern Matching Method and Pattern Matching Apparatus
- Patent Title (中): 模式匹配方法和模式匹配装置
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Application No.: US13502823Application Date: 2010-10-06
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Publication No.: US20120207397A1Publication Date: 2012-08-16
- Inventor: Wataru Nagatomo , Yuichi Abe , Mitsuji Ikeda
- Applicant: Wataru Nagatomo , Yuichi Abe , Mitsuji Ikeda
- Applicant Address: JP Minato-ku, Tokyo
- Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
- Current Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
- Current Assignee Address: JP Minato-ku, Tokyo
- Priority: JP2009-242935 20091022
- International Application: PCT/JP2010/005976 WO 20101006
- Main IPC: G06K9/68
- IPC: G06K9/68

Abstract:
Provided is a template matching method and a template matching apparatus, where the degree of matching between a template and the actual image upon template matching is maintained at a high level, without depending on a partial appearance of a lower layer. Proposed as one embodiment, is a method and an apparatus for template matching, where either an area is set in which comparison of the template and the image is not conducted, or a second area is set inside the template where comparison different from comparison conducted in a first comparison area is to be conducted, and the template matching is conducted on the basis either of comparison excluding the non-comparison area, or of comparison using the first and second areas.
Public/Granted literature
- US08885950B2 Pattern matching method and pattern matching apparatus Public/Granted day:2014-11-11
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