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1.发明授权公开(公告)号：US08971627B2
公开(公告)日：2015-03-03
申请号：US13696260
申请日：2011-03-17
CPC分类号： G06K9/6201 , G01B11/00 , G01B15/00 , G06K9/6202 , G06T7/001 , G06T7/74 , G06T2207/30148 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： The present invention is a template matching processing device capable of evaluating a similarity degree which supports even a case of intensive morphological change between a design image and a photographic image. In the template matching processing device, matching processing between the design image and the photographic image is performed, a partial design image is obtained by clipping a portion having the highest correlation (step 101), and processing for deforming the photographic image in accordance with the clipped design image (steps 102 to 105) is performed, so that correlation between the deformed image obtained and the design image is taken to be set as the similarity degree.
摘要翻译： 本发明是一种模拟匹配处理装置，其能够评价即使在设计图像和摄影图像之间形成密集的情况的情况下也能够支持的相似度。 在模板匹配处理装置中，进行设计图像与摄影图像之间的匹配处理，通过剪切具有最高相关性的部分（步骤101）获得部分设计图像，以及根据 执行剪辑设计图像（步骤102至105），使得获得的变形图像与设计图像之间的相关性被设置为相似度。
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公开(公告)号：US20140023265A1
公开(公告)日：2014-01-23
申请号：US13981963
申请日：2011-12-07
IPC分类号： G06T7/00
CPC分类号： G06T7/0004 , G06T7/001 , G06T2207/10061 , G06T2207/30148 , H01L22/12
摘要： It is an object of the present invention to provide a semiconductor inspection apparatus capable of well carrying out position alignment and correctly determining whether the position alignment has been carried out successfully or has ended in a failure without operator interventions even if an inspected image is an image having few characteristics as is the case with a repetitive pattern or the inspected image is an image having a complicated shape.The semiconductor inspection apparatus includes means for imaging a shape on a wafer or on an exposure mask; means for storing an image inspected by the imaging means; means for storing design data of the semiconductor circuit corresponding to a position on the wafer or on the exposure mask which are to be imaged by the imaging means; means for storing a design-data image obtained as a result of converting the design data into an image; means for generating a design-data ROI image by converting an interest drawing region found from a relative crude-density relation of a shape included in the design-data image into an image; and a position alignment section configured to carry out position alignment on the inspected image and the design-data image. The semiconductor inspection apparatus makes use of the design-data ROI image in order to identify a position at which the inspected image and the design-data image match each other or compute the degree of coincidence.
摘要翻译： 本发明的目的是提供一种半导体检查装置，即使被检查的图像是图像，也能够良好地执行位置对准并且正确地确定位置对准是否已经成功地执行或者在没有操作者干预的情况下已经结束 具有与重复图案的情况相同的特性，或被检查图像是具有复杂形状的图像。 半导体检查装置包括用于对晶片或曝光掩模上的形状进行成像的装置; 用于存储由成像装置检查的图像的装置; 用于存储对应于要由成像装置成像的晶片或曝光掩模上的位置的半导体电路的设计数据的装置; 用于存储作为将设计数据转换为图像而获得的设计数据图像的装置; 用于通过将从所述设计数据图像中包含的形状的相对粗密度关系中找到的兴趣绘制区域转换为图像来生成设计数据ROI图像的装置; 以及位置对准部，被配置为在被检查图像和设计数据图像上执行位置对准。 半导体检查装置利用设计数据ROI图像来识别被检查图像和设计数据图像彼此匹配的位置或计算符合度。
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公开(公告)号：US20120207397A1
公开(公告)日：2012-08-16
申请号：US13502823
申请日：2010-10-06
申请人： Wataru Nagatomo , Yuichi Abe , Mitsuji Ikeda
发明人： Wataru Nagatomo , Yuichi Abe , Mitsuji Ikeda
IPC分类号： G06K9/68
CPC分类号： G06K9/6203 , G06K9/6253 , G06K9/6255 , G06K9/6857 , G06T7/74 , G06T2207/10061 , G06T2207/20016 , G06T2207/30148 , H01J2237/221 , H01J2237/226
摘要： Provided is a template matching method and a template matching apparatus, where the degree of matching between a template and the actual image upon template matching is maintained at a high level, without depending on a partial appearance of a lower layer. Proposed as one embodiment, is a method and an apparatus for template matching, where either an area is set in which comparison of the template and the image is not conducted, or a second area is set inside the template where comparison different from comparison conducted in a first comparison area is to be conducted, and the template matching is conducted on the basis either of comparison excluding the non-comparison area, or of comparison using the first and second areas.
摘要翻译： 提供了一种模板匹配方法和模板匹配装置，其中模板匹配之间的模板和实际图像之间的匹配程度保持在高水平，而不依赖于较低层的部分外观。 作为一个实施例，提出了一种用于模板匹配的方法和装置，其中设置了不进行模板和图像的比较的区域，或者在模板内部设置第二区域，其中比较不同于进行比较 将进行第一比较区域，并且基于除非比较区域之外的比较或使用第一和第二区域的比较进行模板匹配。
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4.发明申请公开(公告)号：US20130114898A1
公开(公告)日：2013-05-09
申请号：US13696260
申请日：2011-03-17
IPC分类号： G06K9/62
CPC分类号： G06K9/6201 , G01B11/00 , G01B15/00 , G06K9/6202 , G06T7/001 , G06T7/74 , G06T2207/30148 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： The present invention is a template matching processing device capable of evaluating a similarity degree which supports even a case of intensive morphological change between a design image and a photographic image. In the template matching processing device, matching processing between the design image and the photographic image is performed, a partial design image is obtained by clipping a portion having the highest correlation (step 101), and processing for deforming the photographic image in accordance with the clipped design image (steps 102 to 105) is performed, so that correlation between the deformed image obtained and the design image is taken to be set as the similarity degree.
摘要翻译： 本发明是一种模拟匹配处理装置，其能够评价即使在设计图像和摄影图像之间形成密集的情况的情况下也能够支持的相似度。 在模板匹配处理装置中，进行设计图像与摄影图像之间的匹配处理，通过剪切具有最高相关性的部分（步骤101）获得部分设计图像，以及根据 执行剪辑设计图像（步骤102至105），使得获得的变形图像与设计图像之间的相关性被设置为相似度。
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公开(公告)号：US10535129B2
公开(公告)日：2020-01-14
申请号：US13981963
申请日：2011-12-07
IPC分类号： G06T7/00
摘要： It is an object of the present invention to provide a semiconductor inspection apparatus capable of well carrying out position alignment and correctly determining whether the position alignment has been carried out successfully or has ended in a failure without operator interventions even if an inspected image is an image having few characteristics as is the case with a repetitive pattern or the inspected image is an image having a complicated shape.The semiconductor inspection apparatus includes means for imaging a shape on a wafer or on an exposure mask; means for storing an image inspected by the imaging means; means for storing design data of the semiconductor circuit corresponding to a position on the wafer or on the exposure mask which are to be imaged by the imaging means; means for storing a design-data image obtained as a result of converting the design data into an image; means for generating a design-data ROI image by converting an interest drawing region found from a relative crude-density relation of a shape included in the design-data image into an image; and a position alignment section configured to carry out position alignment on the inspected image and the design-data image. The semiconductor inspection apparatus makes use of the design-data ROI image in order to identify a position at which the inspected image and the design-data image match each other or compute the degree of coincidence.
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公开(公告)号：US08885950B2
公开(公告)日：2014-11-11
申请号：US13502823
申请日：2010-10-06
申请人： Wataru Nagatomo , Yuichi Abe , Mitsuji Ikeda
发明人： Wataru Nagatomo , Yuichi Abe , Mitsuji Ikeda
CPC分类号： G06K9/6203 , G06K9/6253 , G06K9/6255 , G06K9/6857 , G06T7/74 , G06T2207/10061 , G06T2207/20016 , G06T2207/30148 , H01J2237/221 , H01J2237/226
摘要： Provided is a template matching method and a template matching apparatus, where the degree of matching between a template and the actual image upon template matching is maintained at a high level, without depending on a partial appearance of a lower layer. Proposed as one embodiment, is a method and an apparatus for template matching, where either an area is set in which comparison of the template and the image is not conducted, or a second area is set inside the template where comparison different from comparison conducted in a first comparison area is to be conducted, and the template matching is conducted on the basis either of comparison excluding the non-comparison area, or of comparison using the first and second areas.
摘要翻译： 提供了一种模板匹配方法和模板匹配装置，其中模板匹配之间的模板和实际图像之间的匹配程度保持在高水平，而不依赖于较低层的部分外观。 作为一个实施例，提出了一种用于模板匹配的方法和装置，其中设置了不进行模板和图像的比较的区域，或者在模板内部设置第二区域，其中比较不同于进行比较 将进行第一比较区域，并且基于除非比较区域之外的比较或使用第一和第二区域的比较进行模板匹配。
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公开(公告)号：US20140016854A1
公开(公告)日：2014-01-16
申请号：US14001376
申请日：2011-12-12
申请人： Wataru Nagatomo , Yuichi Abe , Keisuke Nakashima
发明人： Wataru Nagatomo , Yuichi Abe , Keisuke Nakashima
IPC分类号： G06T7/00
CPC分类号： G06T7/001 , G06K9/685 , G06T2207/30148
摘要： The present invention aims at providing a pattern matching device that conducts pattern matching on an image including a plurality of regions having different features with high precision, such as a pattern image including a plurality of layers.In order to achieve the above object, the present invention proposes a pattern matching device that executes pattern matching on a target image with the use of a template formed on the basis of design data or a picked-up image, which executes the pattern matching on a first target image with the use of a first template including a plurality of different patterns, creates a second target image with the exclusion of information on a region including a specific pattern from the first target image, and determines the degree of similarity between the second target image, and a second template including pattern information other than the specific pattern.
摘要翻译： 本发明旨在提供一种图案匹配装置，其对包括具有高精度的不同特征的多个区域的图像（诸如包括多个图案的图案图像）进行图案匹配。 为了实现上述目的，本发明提出一种模式匹配装置，其使用基于设计数据形成的模板或执行模式匹配的拍摄图像来对目标图像执行模式匹配 使用包括多个不同图案的第一模板的第一目标图像从第一目标图像创建排除包括特定图案的区域的信息的第二目标图像，并且确定第二目标图像之间的相似度 目标图像，以及包括特定图案以外的图案信息的第二模板。
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8.发明申请Scanning Electron Microscope and a Method for Imaging a Specimen Using the Same 有权扫描电子显微镜和使用其的成像样品的方法公开(公告)号：US20120181426A1
公开(公告)日：2012-07-19
申请号：US13432176
申请日：2012-03-28
IPC分类号： G01N23/00
CPC分类号： G01N23/20 , H01J37/21 , H01J37/265 , H01J37/28 , H01J2237/1532 , H01J2237/1536 , H01J2237/216 , H01J2237/2817
摘要： (1) part or all of the number, coordinates and size/shape and imaging sequence of imaging points each for observation, the imaging position change method and imaging conditions can be calculated automatically from CAD data, (2) a combination of input information and output information for imaging recipe creation can be set arbitrarily, and (3) decision is made of imaging or processing at an arbitrary imaging point as to whether to be successful/unsuccessful and in case a failure is determined, a relief process can be conducted in which the imaging point or imaging sequence is changed.
摘要翻译： （1）可以从CAD数据自动计算成像点的数量，坐标，成像顺序，成像位置的各部分，成像顺序，成像位置变化方法和成像条件，（2）输入信息和 用于成像配方创建的输出信息可以任意设定，并且（3）决定是否成功/成功的任意成像点的成像或处理，并且在确定失败的情况下，可以进行解除处理 成像点或成像序列改变。
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9.发明申请SCANNING ELECTRON MICROSCOPE AND METHOD OF MEASURING PATTERN DIMENSION USING THE SAME 审中-公开扫描电子显微镜及使用其测量图案尺寸的方法公开(公告)号：US20090212215A1
公开(公告)日：2009-08-27
申请号：US12369774
申请日：2009-02-12
申请人： Wataru Nagatomo , Chie Shishido , Maki Tanaka
发明人： Wataru Nagatomo , Chie Shishido , Maki Tanaka
IPC分类号： G01N23/00
CPC分类号： G01N23/225
摘要： In dimension measurement of semiconductor pattern by CD-SEM, the error value between dimensional measurement value and actual dimension on the pattern is much variational as it is dependent on the cross-sectional shape of the pattern, and a low level of accuracy was one time a big problem. In the present invention, a plurality of patterns, each different in shape, were prepared beforehand with AFM measurement result and patterns of the same shape measured by CD-SEM. These measurement results and dimensional errors were homologized with each other and kept in a database. For actual measurement of dimensions, most like side wall shape, and corresponding CD-SEM measurement error result are called up, and the called-up error results are used to correct CD-SME results of measurement object patterns. In this manner, it becomes possible to correct or reduce dimensional error which is dependent on cross-sectional shape of the pattern.
摘要翻译： 通过CD-SEM对半导体图案的尺寸测量，尺寸测量值与图案上的实际尺寸之间的误差值是很大的变化，因为它取决于图案的截面形状，并且低水平的精度是一次 一个大问题。 在本发明中，通过AFM测定结果和通过CD-SEM测定的相同形状的图案，预先制作各种不同形状的图案。 将这些测量结果和尺寸误差彼此同源化并保存在数据库中。 对于尺寸的实际测量，调用大多数侧壁形状和相应的CD-SEM测量误差结果，并使用调用误差结果来校正测量对象图案的CD-SME结果。 以这种方式，可以校正或减小取决于图案的横截面形状的尺寸误差。
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公开(公告)号：US07559047B2
公开(公告)日：2009-07-07
申请号：US11342694
申请日：2006-01-31
CPC分类号： G03F7/70625
摘要： In an imaging recipe creating apparatus that uses a scanning electron microscope to create an imaging recipe for SEM observation of a semiconductor pattern, in order that the imaging recipe for measuring the wiring width and other various dimension values of the pattern from an observation image and thus evaluating the shape of the pattern is automatically generated within a minimum time by the analysis using the CAD image obtained by conversion from CAD data, an CAD image creation unit that creates the CAD image by converting the CAD data into an image format includes an image-quantizing width determining section, a brightness information providing section, and a pattern shape deformation processing section; the imaging recipe being created using the CAD image created by the CAD image creation unit.
摘要翻译： 在使用扫描电子显微镜创建半导体图案的SEM观察的成像配方的成像配方制作装置中，为了从观察图像测量布线宽度和图案的其他各种尺寸值的成像配方，从而 通过使用通过从CAD数据转换获得的CAD图像的分析，在最小时间内自动生成图案的形状，通过将CAD数据转换为图像格式来创建CAD图像的CAD图像创建单元， 量化宽度确定部分，亮度信息提供部分和图案形状变形处理部分; 使用由CAD图像创建单元创建的CAD图像来创建成像配方。
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