发明申请
- 专利标题: FORMING METHOD OF PERFORMING FORMING ON VARIABLE RESISTANCE NONVOLATILE MEMORY ELEMENT, AND VARIABLE RESISTANCE NONVOLATILE MEMORY DEVICE
- 专利标题(中): 形成可变电阻非易失性存储器元件和可变电阻非易失性存储器件的形成方法
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申请号: US13511275申请日: 2011-09-28
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公开(公告)号: US20120230085A1公开(公告)日: 2012-09-13
- 发明人: Ken Kawai , Kazuhiko Shimakawa , Koji Katayama , Shunsaku Muraoka
- 申请人: Ken Kawai , Kazuhiko Shimakawa , Koji Katayama , Shunsaku Muraoka
- 优先权: JP2010-216353 20100928
- 国际申请: PCT/JP2011/005462 WO 20110928
- 主分类号: G11C11/00
- IPC分类号: G11C11/00
摘要:
In forming, an automatic forming circuit (210) included in a nonvolatile memory device (200) causes a constant current IL to flow in a selected memory cell having a considerably high initial resistance. When the forming generates a filament path in the memory cell and thereby a resistance value is decreased, a potential of a node NBL and a potential of a node Nin are also decreased. If the potentials become lower than that of a reference voltage Vref, an output NO of a difference amplifier (303) for detecting forming success is activated, and a forming success signal Vfp is activated after a delay time depending on the number n of flip flops FF1 to FFn and a clock signal CLK. Thereby, a switch transistor (301) is in a non-conducting state and the forming on a variable resistance element is automatically terminated.
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