发明申请
US20120238107A1 PROCESSING METHOD FOR FORMING STRUCTURE INCLUDING AMORPHOUS CARBON FILM
有权
用于形成包括非晶碳膜的结构的处理方法
- 专利标题: PROCESSING METHOD FOR FORMING STRUCTURE INCLUDING AMORPHOUS CARBON FILM
- 专利标题(中): 用于形成包括非晶碳膜的结构的处理方法
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申请号: US13485424申请日: 2012-05-31
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公开(公告)号: US20120238107A1公开(公告)日: 2012-09-20
- 发明人: Mitsuhiro Okada , Yukio Tojo
- 申请人: Mitsuhiro Okada , Yukio Tojo
- 申请人地址: JP Tokyo
- 专利权人: TOKYO ELECTRON LIMITED
- 当前专利权人: TOKYO ELECTRON LIMITED
- 当前专利权人地址: JP Tokyo
- 优先权: JP2009-135483 20090604; JP2010-094417 20100415
- 主分类号: H01L21/3205
- IPC分类号: H01L21/3205 ; G05B15/02
摘要:
A processing method for forming a structure including an amorphous carbon film includes performing a preliminary treatment of removing water from a surface of the underlying layer by heating the inside of the reaction chamber at a preliminary treatment temperature of 800 to 950° C. and supplying a preliminary treatment gas selected from the group consisting of nitrogen gas and ammonia gas into the reaction chamber while exhausting gas from inside the reaction chamber; and, then performing main CVD of forming an amorphous carbon film on the underlying layer by heating the inside of the reaction chamber at a main process temperature and supplying a hydrocarbon gas into the reaction chamber while exhausting gas from inside the reaction chamber.
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