发明申请
- 专利标题: PHOTOCURABLE PRESSURE-SENSITIVE ADHESIVE COMPOSITION, PHOTOCURABLE PRESSURE-SENSITIVE ADHESIVE LAYER, AND PHOTOCURABLE PRESSURE-SENSITIVE ADHESIVE SHEET
- 专利标题(中): 可光敏压敏粘合剂组合物,可光敏压敏粘合剂层和可光敏压敏粘合片
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申请号: US13513437申请日: 2010-12-01
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公开(公告)号: US20120244349A1公开(公告)日: 2012-09-27
- 发明人: Shigeru Fujita , Yutaka Moroishi , Fumiko Nakano , Tetsuo Inoue
- 申请人: Shigeru Fujita , Yutaka Moroishi , Fumiko Nakano , Tetsuo Inoue
- 优先权: JP2009-275842 20091203
- 国际申请: PCT/JP2010/071475 WO 20101201
- 主分类号: C09J151/06
- IPC分类号: C09J151/06 ; B32B27/28 ; C08F4/30
摘要:
Provided is a photocurable pressure-sensitive adhesive composition which does not cause oozing under ordinary temperature and pressure conditions and exhibits sufficient initial tack via drying and crosslinking. The photocurable pressure-sensitive adhesive composition is easily curable by light irradiation and can form a curable pressure-sensitive adhesive layer having high peel resistance. Also provided are a photocurable pressure-sensitive adhesive layer and a photocurable pressure-sensitive adhesive sheet. A photocurable pressure-sensitive adhesive composition is prepared which comprises a graft polymer obtained by grafting a chain that contains a monomer bearing a cyclic ether group onto a (meth)acrylic polymer that contains 0.2 to 10% by weight of hydroxyalkyl(meth)acrylamide monomer units, and a cationic photopolymerization initiator. A photocurable pressure-sensitive adhesive layer using such composition and a photocurable pressure-sensitive adhesive sheet are also prepared.
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