发明申请
- 专利标题： PHOTORESIST COMPOSITION
- 专利标题（中）： 光电组合物
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申请号： US13428555申请日： 2012-03-23
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公开(公告)号： US20120251945A1公开(公告)日： 2012-10-04
- 发明人: Koji ICHIKAWA , Hiromu SAKAMOTO , Yuichi MUKAI
- 申请人： Koji ICHIKAWA , Hiromu SAKAMOTO , Yuichi MUKAI
- 申请人地址： JP Tokyo
- 专利权人： SUMITOMO CHEMICAL COMPANY, LIMITED
- 当前专利权人： SUMITOMO CHEMICAL COMPANY, LIMITED
- 当前专利权人地址： JP Tokyo
- 优先权： JP2011-070035 20110328; JP2011-105140 20110510
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; C07D411/12 ; C07D305/06 ; G03F7/027 ; G03F7/20
摘要：
The present invention provides a photoresist composition containing: a resin which contains a structural unit derived from a compound having an acid-labile group and which is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid; an acid generator and a compound represented by the formula (I): wherein R1, X1, R2, u1, s1, t1 are each defined in the specification, with the proviso that sum of s1 and t1 is 1 or 2.
公开/授权文献
- US08753795B2 Photoresist composition 公开/授权日：2014-06-17
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