发明申请
US20120260947A1 SUBSTRATE CLEANING APPARATUS, SUBSTRATE CLEANING METHOD, AND COMPUTER-READABLE RECORDING MEDIUM HAVING SUBSTRATE CLEANING PROGRAM RECORDED THEREIN
审中-公开
基板清洁装置，基板清洁方法和具有记录的基板清洁程序的计算机可读记录介质
- 专利标题： SUBSTRATE CLEANING APPARATUS, SUBSTRATE CLEANING METHOD, AND COMPUTER-READABLE RECORDING MEDIUM HAVING SUBSTRATE CLEANING PROGRAM RECORDED THEREIN
- 专利标题（中）： 基板清洁装置，基板清洁方法和具有记录的基板清洁程序的计算机可读记录介质
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申请号： US13444377申请日： 2012-04-11
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公开(公告)号： US20120260947A1公开(公告)日： 2012-10-18
- 发明人: Satoshi KANEKO
- 申请人： Satoshi KANEKO
- 优先权： JP2011-088664 20110412; JP2011-088665 20110412
- 主分类号： B08B7/04
- IPC分类号： B08B7/04 ; B08B5/04 ; B08B3/02
摘要：
Provided are a substrate cleaning apparatus, a substrate cleaning method, and a substrate cleaning program that preferably cleans the substrate without causing damage on the surface of the substrate. The substrate cleaning apparatus includes a liquid layer holding unit including a substrate cleaning nozzle that holds a liquid layer of the cleaning solution, a substrate heating unit that heats the surface of the substrate higher than the boiling point of the cleaning solution, and a moving up/down mechanism that approaches a substrate cleaning nozzle to the substrate. The moving up/down mechanism is controlled to boil the liquid layer held in the substrate cleaning nozzle by the heat of the surface of the substrate heated by the substrate heating unit to form a vapor layer between the surface of the substrate and the liquid layer to clean the surface of the substrate.