发明申请
US20120263920A1 Photosensitive Polymer Composition, Method of Producing Pattern and Electronic Parts
有权
光敏聚合物组合物，生产图案和电子零件的方法
- 专利标题： Photosensitive Polymer Composition, Method of Producing Pattern and Electronic Parts
- 专利标题（中）： 光敏聚合物组合物，生产图案和电子零件的方法
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申请号： US13528989申请日： 2012-06-21
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公开(公告)号： US20120263920A1公开(公告)日： 2012-10-18
- 发明人: Masayuki Ooe , Hiroshi Komatsu , Yoshiko Tsumaru , Dai Kawasaki , Kouji Katou , Takumi Ueno
- 申请人： Masayuki Ooe , Hiroshi Komatsu , Yoshiko Tsumaru , Dai Kawasaki , Kouji Katou , Takumi Ueno
- 优先权： JP2004-006715 20040114
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; B32B3/30 ; G03F7/20
摘要：
A photosensitive polymer composition includes (a) a polyamide having a repeating unit represented by the following general formula (I): wherein U represents a tetravalent organic group, V represents a bivalent organic group and p is an integer representing a number of the repeating unit; (b) a compound which generates an acid upon receiving light; and (c) a compound represented by the following general formula (II): wherein m and n are each independently integer of 1 or 2, Rs are each independently hydrogen, alkyl group or acyl group, and R1 and R2 each independently represents fluoroalkyl group having 1 to 3 carbon atoms.
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