发明申请
- 专利标题: STRUCTURE AND DESIGN STRUCTURE FOR HIGH-Q VALUE INDUCTOR AND METHOD OF MANUFACTURING THE SAME
- 专利标题(中): 高Q值电感器的结构与设计结构及其制造方法
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申请号: US13535412申请日: 2012-06-28
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公开(公告)号: US20120267794A1公开(公告)日: 2012-10-25
- 发明人: Hanyi DING , Mete ERTURK , Robert A. GROVES , Zhong-Xiang HE , Peter J. LINDGREN , Anthony K. STAMPER
- 申请人: Hanyi DING , Mete ERTURK , Robert A. GROVES , Zhong-Xiang HE , Peter J. LINDGREN , Anthony K. STAMPER
- 申请人地址: US NY Armonk
- 专利权人: INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人: INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人地址: US NY Armonk
- 主分类号: H01L23/48
- IPC分类号: H01L23/48
摘要:
Structures with high-Q value inductors, design structure for high-Q value inductors and methods of fabricating such structures is disclosed herein. A method in a computer-aided design system for generating a functional design model of an inductor is also provided. The method includes: generating a functional representation of a plurality of vertical openings simultaneously formed in a substrate, wherein a first of the plurality of vertical openings is used as through silicon vias and is etched deeper than a second of the plurality of vertical openings used for high-Q inductors; generating a functional representation of a dielectric layer formed in the plurality of vertical openings; and generating a functional representation of a metal layer deposited on the dielectric layer in the plurality of vertical.
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