发明申请
- 专利标题: CHARGED PARTICLE SYSTEM FOR PROCESSING A TARGET SURFACE
- 专利标题(中): 用于处理目标表面的充电颗粒系统
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申请号: US13458936申请日: 2012-04-27
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公开(公告)号: US20120273691A1公开(公告)日: 2012-11-01
- 发明人: Alrik van den Brom , Stijn Willem Herman Karel Steenbrink , Marco Jan-Jaco Wieland , Guido De Boer , Pieter Kappelhof
- 申请人: Alrik van den Brom , Stijn Willem Herman Karel Steenbrink , Marco Jan-Jaco Wieland , Guido De Boer , Pieter Kappelhof
- 优先权: NL2007392 20110912
- 主分类号: H01J3/14
- IPC分类号: H01J3/14
摘要:
The invention relates to a charged particle system for processing a target surface with at least one charged particle beam. The system comprises an optical column with a beam generator module for generating a plurality of charged particle beams, a beam modulator module for switching on and off said plurality of beams and a beam projector module for projecting beams or subbeams on said target surface. The system further comprises a frame supporting each of said modules in a fixed position and alignment elements for aligning at least one of beams and/or subbeams with a downstream module element.
公开/授权文献
- US09362084B2 Electro-optical element for multiple beam alignment 公开/授权日:2016-06-07
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