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    Assembly for providing an aligned stack of two or more modules and a lithography system or a microscopy system comprising such an assembly
    3.
    发明授权
    Assembly for providing an aligned stack of two or more modules and a lithography system or a microscopy system comprising such an assembly 有权
    用于提供两个或多个模块的对准堆叠的组件以及包括这种组件的光刻系统或显微镜系统

    公开(公告)号：US08710461B2

    公开(公告)日：2014-04-29

    申请号：US13612498

    申请日：2012-09-12

    申请人： Pieter Kappelhof

    发明人： Pieter Kappelhof

    IPC分类号： H01J3/14

    CPC分类号： A47B55/00 ,  B82Y10/00 ,  B82Y40/00 ,  G21K1/065 ,  H01J37/023 ,  H01J37/26 ,  H01J37/3177 ,  H01J2237/032 ,  H01J2237/036

    摘要： The invention relates to an assembly, preferably for use in a lithography system or a microscopy system, for providing an accurately aligned stack of two or more modules in a stacking direction. Each of the two or more modules comprises three support members. The assembly comprises a frame comprising three planar alignment surfaces which extend in the stacking direction and which are angularly off-set with respect to each other. In addition each of the three support members of each one of the two or more modules, when arranged in said frame, abuts against a corresponding one of the three alignment surfaces. The frame is provided with an opening between two of the three planar alignment surfaces for inserting a module in the assembly, said two planar alignment surfaces on either side of the opening are arranged at least partially facing said opening.

    摘要翻译： 本发明涉及一种组件，优选用于光刻系统或显微镜系统，用于在层叠方向上提供两个或多个模块的精确对准的堆叠。 两个或更多个模块中的每一个包括三个支撑构件。 组件包括框架，该框架包括在层叠方向上延伸并相对于彼此成角度偏移的三个平面对准表面。 此外，当布置在所述框架中时，两个或更多个模块中的每一个的三个支撑构件中的每一个抵靠三个对准表面中的对应的一个。 框架设置有三个平面对准表面中的两个之间的开口，用于将模块插入组件中，开口任一侧上的两个平面对准表面布置成至少部分地面对所述开口。

    ASSEMBLY FOR PROVIDING AN ALIGNED STACK OF TWO OR MORE MODULES AND A LITHOGRAPHY SYSTEM OR A MICROSCOPY SYSTEM COMPRISING SUCH AN ASSEMBLY
    4.
    发明申请
    ASSEMBLY FOR PROVIDING AN ALIGNED STACK OF TWO OR MORE MODULES AND A LITHOGRAPHY SYSTEM OR A MICROSCOPY SYSTEM COMPRISING SUCH AN ASSEMBLY 有权
    用于提供两个或更多个模块的对齐堆叠的组件以及包含这样组装的显微系统或显微系统

    公开(公告)号：US20130087702A1

    公开(公告)日：2013-04-11

    申请号：US13612498

    申请日：2012-09-12

    申请人： Pieter Kappelhof

    发明人： Pieter Kappelhof

    IPC分类号： A47B55/00 ,  G21K1/06

    CPC分类号： A47B55/00 ,  B82Y10/00 ,  B82Y40/00 ,  G21K1/065 ,  H01J37/023 ,  H01J37/26 ,  H01J37/3177 ,  H01J2237/032 ,  H01J2237/036

    摘要： The invention relates to an assembly, preferably for use in a lithography system or a microscopy system, for providing an accurately aligned stack of two or more modules in a stacking direction. Each of the two or more modules comprises three support members. The assembly comprises a frame comprising three planar alignment surfaces which extend in the stacking direction and which are angularly off-set with respect to each other. In addition each of the three support members of each one of the two or more modules, when arranged in said frame, abuts against a corresponding one of the three alignment surfaces. The frame is provided with an opening between two of the three planar alignment surfaces for inserting a module in the assembly, said two planar alignment surfaces on either side of the opening are arranged at least partially facing said opening.

    摘要翻译： 本发明涉及一种组件，优选用于光刻系统或显微镜系统，用于在层叠方向上提供两个或多个模块的精确对准的堆叠。 两个或更多个模块中的每一个包括三个支撑构件。 组件包括框架，该框架包括在层叠方向上延伸并相对于彼此成角度偏移的三个平面对准表面。 此外，当布置在所述框架中时，两个或更多个模块中的每一个的三个支撑构件中的每一个抵靠三个对准表面中的对应的一个。 框架设置有三个平面对准表面中的两个之间的开口，用于将模块插入组件中，开口任一侧上的两个平面对准表面布置成至少部分地面对所述开口。

    Support structure for wafer table
    5.
    发明授权
    Support structure for wafer table 有权
    晶圆台支撑结构

    公开(公告)号：US09146480B2

    公开(公告)日：2015-09-29

    申请号：US13607469

    申请日：2012-09-07

    申请人： Pieter Kappelhof ,  Jerry Johannes Martinus Peijster ,  Dennis Kemperman

    发明人： Pieter Kappelhof ,  Jerry Johannes Martinus Peijster ,  Dennis Kemperman

    IPC分类号： G03B27/58 ,  G03F7/20

    CPC分类号： G03F7/707 ,  G03F7/70783

    摘要： The invention relates to a support structure for supporting a wafer table in a lithography system, said support structure comprising: a base comprising a reference surface, an interface member, made from a low thermal expansion material, arranged on top of said base and adapted for positioning said wafer table on the support structure, wherein said interface member is connected to said reference surface via at least one strut, and wherein the at least one strut is made from a low thermal expansion material. The invention further relates to a lithography system comprising such a support structure.

    摘要翻译： 本发明涉及一种用于在光刻系统中支撑晶片台的支撑结构，所述支撑结构包括：底座，包括参考表面，由低热膨胀材料制成的接口构件，该接口构件布置在所述基座的顶部上， 将所述晶片台定位在所述支撑结构上，其中所述接口构件经由至少一个支柱连接到所述参考表面，并且其中所述至少一个支柱由低热膨胀材料制成。 本发明还涉及包括这种支撑结构的光刻系统。

    SUPPORT STRUCTURE FOR WAFER TABLE
    6.
    发明申请
    SUPPORT STRUCTURE FOR WAFER TABLE 有权
    WAFER TABLE支撑结构

    公开(公告)号：US20130063712A1

    公开(公告)日：2013-03-14

    申请号：US13607469

    申请日：2012-09-07

    申请人： Pieter Kappelhof ,  Jerry Johannes Martinus Peijster ,  Dennis Kemperman

    发明人： Pieter Kappelhof ,  Jerry Johannes Martinus Peijster ,  Dennis Kemperman

    IPC分类号： G03B27/58

    CPC分类号： G03F7/707 ,  G03F7/70783

    摘要： The invention relates to a support structure for supporting a wafer table in a lithography system, said support structure comprising: a base comprising a reference surface, an interface member, made from a low thermal expansion material, arranged on top of said base and adapted for positioning said wafer table on the support structure, wherein said interface member is connected to said reference surface via at least one strut, and wherein the at least one strut is made from a low thermal expansion material. The invention further relates to a lithography system comprising such a support structure.

    摘要翻译： 本发明涉及一种用于在光刻系统中支撑晶片台的支撑结构，所述支撑结构包括：底座，包括参考表面，由低热膨胀材料制成的接口构件，该接口构件布置在所述基座的顶部上， 将所述晶片台定位在所述支撑结构上，其中所述接口构件经由至少一个支柱连接到所述参考表面，并且其中所述至少一个支柱由低热膨胀材料制成。 本发明还涉及包括这种支撑结构的光刻系统。