发明申请
- 专利标题: FIN-INTEGRATED SUBSTRATE AND MANUFACTURING METHOD OF FIN-INTEGRATED SUBSTRATE
- 专利标题(中): 精细整合基板和精细集成基板的制造方法
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申请号: US13521922申请日: 2011-01-12
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公开(公告)号: US20120279761A1公开(公告)日: 2012-11-08
- 发明人: Hisashi Hori , Hideyo Osanai , Takayuki Takahashi
- 申请人: Hisashi Hori , Hideyo Osanai , Takayuki Takahashi
- 申请人地址: JP Tokyo JP Tokyo
- 专利权人: Nippon Light Metal Company, Ltd.,Dowa Metaltech Co., Ltd.
- 当前专利权人: Nippon Light Metal Company, Ltd.,Dowa Metaltech Co., Ltd.
- 当前专利权人地址: JP Tokyo JP Tokyo
- 优先权: JP2010-003630 20100112; JP2011-000386 20110105
- 国际申请: PCT/JP2011/050381 WO 20110112
- 主分类号: H05K7/20
- IPC分类号: H05K7/20 ; H05K13/04
摘要:
There is provide a manufacturing method of a fin-integrated substrate capable of producing by simple process a fin-integrated substrate with heat radiating fins at fine pitches by a processing method in which warpage of a metal base plate and corrugation (wavy shape) of the heat radiating fins are suppressed. There is provided a manufacturing method of a fin-integrated substrate in which bonding of the metal circuit board to the ceramic substrate is performed by a molten metal bonding method, and formation of the plurality of heat radiating fins at a cut part that is a part of the metal base plate is performed by fixing by a jig to apply a tensile stress on a surface of the cut part where the heat radiating fins are to be formed, and performing grooving processing of forming a plurality of grooves by moving a multi-cutter composed of a plurality of stacked disc-shaped cutters, on the surface to which the tensile stress is applied, while rotating the multi-cutter.
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