Invention Application
US20120280125A1 CHARGED PARTICLE SYSTEM FOR RETICLE / WAFER DEFECTS INSPECTION AND REVIEW
有权
充电颗粒系统用于反渗透/缺陷检测和检查
- Patent Title: CHARGED PARTICLE SYSTEM FOR RETICLE / WAFER DEFECTS INSPECTION AND REVIEW
- Patent Title (中): 充电颗粒系统用于反渗透/缺陷检测和检查
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Application No.: US13463208Application Date: 2012-05-03
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Publication No.: US20120280125A1Publication Date: 2012-11-08
- Inventor: CHIYAN KUAN , YI-XIANG WANG , CHUNG-SHIH PAN , ZHONGHUA DONG , ZHONGWEI CHEN
- Applicant: CHIYAN KUAN , YI-XIANG WANG , CHUNG-SHIH PAN , ZHONGHUA DONG , ZHONGWEI CHEN
- Applicant Address: TW Hsinchu City
- Assignee: HERMES MICROVISION INC.
- Current Assignee: HERMES MICROVISION INC.
- Current Assignee Address: TW Hsinchu City
- Main IPC: G01N23/225
- IPC: G01N23/225 ; G21K5/10
Abstract:
The present invention relates to a charged particle system for reticle or semiconductor wafer defects inspection and review, and more particularly, relates to an E-beam inspection tool for reticle or semiconductor wafer defects inspection and review without gravitational AMC settling. The charged particle system is an upside down electron beam inspection system with an electron beam aimed upward. The face down design may prevent AMC from gravitational settling on the inspected face of the specimen during inspection, thereafter having a cleaner result compared with conventional face-up inspection system.
Public/Granted literature
- US08519333B2 Charged particle system for reticle/wafer defects inspection and review Public/Granted day:2013-08-27
Information query
