发明申请
US20120286261A1 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF 有权
半导体器件及其制造方法

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
摘要:
In a transistor including a wide band gap semiconductor layer as a semiconductor layer, a wide band gap semiconductor layer is separated into an island shape by an insulating layer with passivation properties for preventing atmospheric components from permeating. The edge portion of the island shape wide band gap semiconductor layer is in contact with the insulating film; thus, moisture or atmospheric components can be prevented from entering from the edge portion of the semiconductor layer to the wide band gap semiconductor layer.
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