发明申请
US20120292751A1 Semiconductor Device and Method of Forming Holes in Substrate to Interconnect Top Shield and Ground Shield
有权
半导体器件和在基板上形成孔以互连顶部屏蔽和接地屏蔽的方法
- 专利标题: Semiconductor Device and Method of Forming Holes in Substrate to Interconnect Top Shield and Ground Shield
- 专利标题(中): 半导体器件和在基板上形成孔以互连顶部屏蔽和接地屏蔽的方法
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申请号: US13569088申请日: 2012-08-07
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公开(公告)号: US20120292751A1公开(公告)日: 2012-11-22
- 发明人: OhHan Kim , SunMi Kim , KyungHoon Lee
- 申请人: OhHan Kim , SunMi Kim , KyungHoon Lee
- 申请人地址: SG Singapore
- 专利权人: STATS CHIPPAC, LTD.
- 当前专利权人: STATS CHIPPAC, LTD.
- 当前专利权人地址: SG Singapore
- 主分类号: H01L21/56
- IPC分类号: H01L21/56 ; H01L23/552
摘要:
A semiconductor device includes a multi-layer substrate. A ground shield is disposed between layers of the substrate and electrically connected to a ground point. A plurality of semiconductor die is mounted to the substrate over the ground shield. The ground shield extends beyond a footprint of the plurality of semiconductor die. An encapsulant is formed over the plurality of semiconductor die and substrate. Dicing channels are formed in the encapsulant, between the plurality of semiconductor die, and over the ground shield. A plurality of metal-filled holes is formed along the dicing channels, and extends into the substrate and through the ground shield. A top shield is formed over the plurality of semiconductor die and electrically and mechanically connects to the ground shield through the metal-filled holes. The top and ground shields are configured to block electromagnetic interference generated with respect to an integrated passive device disposed in the semiconductor die.
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