Invention Application
- Patent Title: LITHOGRAPHIC APPARATUS AND COMPONENT
- Patent Title (中): 平面设备和组件
-
Application No.: US13478888Application Date: 2012-05-23
-
Publication No.: US20120300187A1Publication Date: 2012-11-29
- Inventor: Han-Kwang NIENHUYS , Franciscus Johannes Joseph JANSSEN , Sven PEKELDER , Roger Wilhelmus Antonius Henricus SCHMITZ , Alexander Marinus Arnoldus HUIJBERTS , Paulus Albertus Maria GASSELING
- Applicant: Han-Kwang NIENHUYS , Franciscus Johannes Joseph JANSSEN , Sven PEKELDER , Roger Wilhelmus Antonius Henricus SCHMITZ , Alexander Marinus Arnoldus HUIJBERTS , Paulus Albertus Maria GASSELING
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Main IPC: G03B27/58
- IPC: G03B27/58
Abstract:
A lithographic apparatus includes a substrate table constructed to hold a substrate, and a projection system configured to project a patterned radiation beam onto a target portion of the substrate. A surface of a component of the lithographic apparatus that is in a vacuum environment in use is provided with a repeating structure configured to increase the effective thermal accommodation coefficient of the surface.
Public/Granted literature
Information query
