发明申请
- 专利标题: POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND LYOPHOBIC FILM
- 专利标题(中): 阳性光敏树脂组合物和荧光膜
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申请号: US13576847申请日: 2011-02-01
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公开(公告)号: US20120301827A1公开(公告)日: 2012-11-29
- 发明人: Tadashi Hatanaka , Megumi Uchiyama
- 申请人: Tadashi Hatanaka , Megumi Uchiyama
- 申请人地址: JP Tokyo
- 专利权人: NISSAN CHEMICAL INDUSTRIES, LTD.
- 当前专利权人: NISSAN CHEMICAL INDUSTRIES, LTD.
- 当前专利权人地址: JP Tokyo
- 优先权: JP2010-021264 20100202
- 国际申请: PCT/JP2011/052046 WO 20110201
- 主分类号: G03F7/075
- IPC分类号: G03F7/075 ; G03F7/20
摘要:
A positive photosensitive resin composition that forms an image for a liquid crystal display device and an organic EL display device, for example. The resin is made of a cured film that is highly water repellent and highly oleophobic on the surface. The resin has insulating properties, retains an excellent image and causes no reflow, for example, when being cured to form a film having excellent reworkability. A positive photosensitive resin composition comprising component (A), component (B), component (C) and component (D); Component (A) is an acrylic polymer containing an acid dissociable group, an aliphatic hydroxy group, and an N-substituted maleimide group; Component (B) is an acrylic polymer containing an acid dissociable group and a blocked isocyanate group; Component (C) is an acrylic polymer containing an acid dissociable group, an aliphatic hydroxy group, a C3-10 fluoroalkyl group, and a silyl ether group, and Component (D) is a photoacid generator.
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