发明申请
US20120303158A1 VACUUM PROCESS DEVICE AND VACUUM PROCESS METHOD 有权
真空过程装置和真空过程方法

VACUUM PROCESS DEVICE AND VACUUM PROCESS METHOD
摘要:
An efficient method of controlling transportation in a linear tool type vacuum process device in a state that a length of time required for a process is not stable. For each process chamber, the number of unprocessed wafers that are in process or are being transported to the process chamber is counted, and in deciding a transport destination of a wafer, when the number of unprocessed wafers is equal to or larger than a charge limit amount, a transport destination of a wafer is decided excluding the process chamber. Also, a wafer holding mechanism on a transport path to a process chamber is reserved, and a transport destination of a processed member to be transported next is decided according to a status of reservation.
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