Invention Application
- Patent Title: RESONATOR STRUCTURES AND METHOD OF MAKING
- Patent Title (中): 谐振器结构及其制作方法
-
Application No.: US13118663Application Date: 2011-05-31
-
Publication No.: US20120306280A1Publication Date: 2012-12-06
- Inventor: Kalaga Murali Krishna , Sudhakar Eddula Reddy , Lohit Matani
- Applicant: Kalaga Murali Krishna , Sudhakar Eddula Reddy , Lohit Matani
- Applicant Address: US NY SCHENECTADY
- Assignee: GENERAL ELECTRIC COMPANY
- Current Assignee: GENERAL ELECTRIC COMPANY
- Current Assignee Address: US NY SCHENECTADY
- Main IPC: H02J17/00
- IPC: H02J17/00 ; H01F41/22 ; H01P7/00

Abstract:
A resonator in the Swiss-roll structure, method of making the resonator structure and the system employing the resonator are disclosed. The resonator includes a plurality of layers, including a ceramic layer and a metallic layer. The ceramic and metallic layers are configured in a Swiss-roll form such that the neighboring ceramic layers are separated by the metallic layer. Further, the ceramic layer includes materials that have a dielectric constant of at least about 10 and dielectric loss tangent less than about 0.01 in the frequency range of about 1 KHz to about 100 MHz. The method of forming the resonator includes the steps of disposing a metallic layer, depositing a dielectric ceramic layer, and forming a Swiss-roll structure of the metallic and ceramic layers. Alternate method includes swaging the dielectric material filled metal tubes and forming into Swiss-rolls. Further steps include heat treating the resultant Swiss-roll structure in vacuum, inert atmosphere, or reducing atmosphere to form a monolithic Swiss-roll structure, such that the air gap between turns of the Swiss-roll structure is less than about 1 μm.
Public/Granted literature
- US09027236B2 Resonator structures and method of making Public/Granted day:2015-05-12
Information query