发明申请
US20120308920A1 SULFONIUM SALT, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION USING SAID POLYMER, AND RESIST PATTERNING PROCESS
有权
磺酸钠，聚合物，使用固体聚合物的化学稳定化学组合物和耐药性方法
- 专利标题： SULFONIUM SALT, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION USING SAID POLYMER, AND RESIST PATTERNING PROCESS
- 专利标题（中）： 磺酸钠，聚合物，使用固体聚合物的化学稳定化学组合物和耐药性方法
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申请号： US13476629申请日： 2012-05-21
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公开(公告)号： US20120308920A1公开(公告)日： 2012-12-06
- 发明人: Daisuke DOMON , Keiichi MASUNAGA , Satoshi WATANABE
- 申请人： Daisuke DOMON , Keiichi MASUNAGA , Satoshi WATANABE
- 申请人地址： JP Tokyo
- 专利权人： SHIN-ETSU CHEMICAL CO., LTD.
- 当前专利权人： SHIN-ETSU CHEMICAL CO., LTD.
- 当前专利权人地址： JP Tokyo
- 优先权： JP2011-120454 20110530
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; G03F1/76 ; C07D487/08 ; C08F228/04
摘要：
There is disclosed a sulfonium salt shown by the following general formula (1). There can be a sulfonium salt capable of introducing an acid-generating unit generating an acid having an appropriate acid strength and not impairing adhesion with a substrate into a base polymer; a polymer using the said sulfonium salt; a chemically amplified resist composition using the said polymer as a base polymer; and a patterning process using the said chemically amplified resist composition.
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