Invention Application
- Patent Title: PARTICLE BEAM TREATMENT DEVICE AND IRRADIATION DOSE SETTING METHOD OF THE PARTICLE BEAM TREATMENT DEVICE
- Patent Title (中): 颗粒束处理装置和颗粒束处理装置的辐照剂量设定方法
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Application No.: US13318866Application Date: 2011-03-08
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Publication No.: US20120313002A1Publication Date: 2012-12-13
- Inventor: Masahiro Ikeda , Hisashi Harada , Osamu Takahashi
- Applicant: Masahiro Ikeda , Hisashi Harada , Osamu Takahashi
- Applicant Address: JP Chiyoda-ku
- Assignee: Mitsubishi Electric Corporation
- Current Assignee: Mitsubishi Electric Corporation
- Current Assignee Address: JP Chiyoda-ku
- International Application: PCT/JP2011/055347 WO 20110308
- Main IPC: A61N5/10
- IPC: A61N5/10

Abstract:
A particle beam treatment device includes an irradiation nozzle which moves a particle beam in a direction which is perpendicular to an advancing direction; a dose monitor which measures the dose of the particle beam; a planning part which sets the irradiation dose applied to a target volume; and a controlling part which controls the irradiation dose applied to a target volume based on irradiation dose set value which is set by a value measured by the dose monitor and the planning part, wherein the planning part stores the absorbed dose distribution data in the depth direction which is prepared in advance using the absorbed dose at the reference depth which is a predetermined position nearer to an incident side of the particle beam than the position of Bragg peak as the reference and calculates the irradiation dose set value using the absorbed dose at the reference depth.
Public/Granted literature
- US08431907B2 Particle beam treatment device and irradiation dose setting method of the particle beam treatment device Public/Granted day:2013-04-30
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