公开(公告)号：US07579608B2

公开(公告)日：2009-08-25

申请号：US11870512

申请日：2007-10-11

Applicant: Osamu Takahashi ,  Yuehu Pu ,  Hisashi Harada ,  Masahiro Ikeda ,  Yasuyuki Takatani ,  Hiroshi Otani

Inventor： Osamu Takahashi ,  Yuehu Pu ,  Hisashi Harada ,  Masahiro Ikeda ,  Yasuyuki Takatani ,  Hiroshi Otani

IPC: G21K5/04

CPC classification number: A61N5/1042 ,  A61B5/1127 ,  A61N5/1064 ,  A61N2005/1059 ,  A61N2005/1087 ,  G21K1/046

Abstract: Provision is made for a particle-beam treatment system in which, even during particle-beam irradiation, the shape of a multileaf collimator is monitored. The particle-beam treatment system, in which multi-layer conformal irradiation is performed while the setting of the shape of the multileaf collimator in an irradiation head is changed during particle-beam irradiation, is provided with an optical shape-monitoring unit mounted attachably and detachably in the snout portion at the downstream side of the multileaf collimator, the optical shape-monitoring unit having a shape-monitoring mirror, opposing the multileaf collimator, for monitoring the shape of the multileaf collimator; a video camera for shooting the multileaf-collimator shape reflected by the shape-monitoring mirror; and an image monitor for displaying an image of the video camera that shoots the shape of the multileaf collimator.

Abstract translation: 规定了一种粒子束处理系统，其中即使在粒子束照射期间，监视多叶准直器的形状。 在粒子束照射期间，在照射头中的多叶准直器的形状的设定被改变的同时进行多层共形照射的粒子束处理系统设置有可安装地安装的光学形状监视单元， 所述光学形状监视单元具有与所述多叶准直器相对的形状监视镜，用于监视所述多叶准直器的形状; 用于拍摄由形状监视镜反射的多叶准直器形状的摄像机; 以及用于显示拍摄多叶准直器的形状的摄像机的图像的图像监视器。

公开(公告)号：US20080298553A1

公开(公告)日：2008-12-04

申请号：US11870512

申请日：2007-10-11

Applicant: Osamu Takahashi ,  Yuehu Pu ,  Hisashi Harada ,  Masahiro Ikeda ,  Yasuyuki Takatani ,  Hiroshi Otani

Inventor： Osamu Takahashi ,  Yuehu Pu ,  Hisashi Harada ,  Masahiro Ikeda ,  Yasuyuki Takatani ,  Hiroshi Otani

IPC: G21K5/04

CPC classification number: A61N5/1042 ,  A61B5/1127 ,  A61N5/1064 ,  A61N2005/1059 ,  A61N2005/1087 ,  G21K1/046

Abstract: Provision is made for a particle-beam treatment system in which, even during particle-beam irradiation, the shape of a multileaf collimator is monitored. The particle-beam treatment system, in which multi-layer conformal irradiation is performed while the setting of the shape of the multileaf collimator in an irradiation head is changed during particle-beam irradiation, is provided with an optical shape-monitoring unit mounted attachably and detachably in the snout portion at the downstream side of the multileaf collimator, the optical shape-monitoring unit having a shape-monitoring mirror, opposing the multileaf collimator, for monitoring the shape of the multileaf collimator; a video camera for shooting the multileaf-collimator shape reflected by the shape-monitoring mirror; and an image monitor for displaying an image of the video camera that shoots the shape of the multileaf collimator.

Abstract translation: 规定了一种粒子束处理系统，其中即使在粒子束照射期间，监视多叶准直器的形状。 在粒子束照射期间，在照射头中的多叶准直器的形状的设定被改变的同时进行多层共形照射的粒子束处理系统设置有可安装地安装的光学形状监视单元， 所述光学形状监视单元具有与所述多叶准直器相对的形状监视镜，用于监视所述多叶准直器的形状; 用于拍摄由形状监视镜反射的多叶准直器形状的摄像机; 以及用于显示拍摄多叶准直器的形状的摄像机的图像的图像监视器。

公开(公告)号：US20120313002A1

公开(公告)日：2012-12-13

申请号：US13318866

申请日：2011-03-08

Applicant: Masahiro Ikeda ,  Hisashi Harada ,  Osamu Takahashi

Inventor： Masahiro Ikeda ,  Hisashi Harada ,  Osamu Takahashi

IPC: A61N5/10

CPC classification number: A61N5/1036 ,  A61N5/1043 ,  A61N2005/1087

Abstract: A particle beam treatment device includes an irradiation nozzle which moves a particle beam in a direction which is perpendicular to an advancing direction; a dose monitor which measures the dose of the particle beam; a planning part which sets the irradiation dose applied to a target volume; and a controlling part which controls the irradiation dose applied to a target volume based on irradiation dose set value which is set by a value measured by the dose monitor and the planning part, wherein the planning part stores the absorbed dose distribution data in the depth direction which is prepared in advance using the absorbed dose at the reference depth which is a predetermined position nearer to an incident side of the particle beam than the position of Bragg peak as the reference and calculates the irradiation dose set value using the absorbed dose at the reference depth.

Abstract translation: 粒子束处理装置包括使粒子束沿与前进方向正交的方向移动的照射喷嘴; 测量粒子束剂量的剂量监测器; 将照射剂量设定在目标体积上的规划部分; 以及控制部，其基于由所述剂量监视器和所述规划部测量的值设定的照射剂量设定值来控制施加于目标体积的照射剂量，其中，所述规划部将所述吸收剂量分布数据存储在所述深度方向 其预先使用在比布拉格峰位置作为基准更靠近粒子束的入射侧的预定位置处的参考深度处的吸收剂量来计算，并且使用参考的吸收剂量来计算照射剂量设定值 深度。

公开(公告)号：US08431907B2

公开(公告)日：2013-04-30

申请号：US13318866

申请日：2011-03-08

Applicant: Masahiro Ikeda ,  Hisashi Harada ,  Osamu Takahashi

Inventor： Masahiro Ikeda ,  Hisashi Harada ,  Osamu Takahashi

IPC: G01J1/42 ,  A61N5/00 ,  G21G5/00

CPC classification number: A61N5/1036 ,  A61N5/1043 ,  A61N2005/1087

Abstract: A particle beam treatment device includes an irradiation nozzle which moves a particle beam in a direction which is perpendicular to an advancing direction; a dose monitor which measures the dose of the particle beam; a planning part which sets the irradiation dose applied to a target volume; and a controlling part which controls the irradiation dose applied to a target volume based on irradiation dose set value which is set by a value measured by the dose monitor and the planning part, wherein the planning part stores the absorbed dose distribution data in the depth direction which is prepared in advance using the absorbed dose at the reference depth which is a predetermined position nearer to an incident side of the particle beam than the position of Bragg peak as the reference and calculates the irradiation dose set value using the absorbed dose at the reference depth.

Abstract translation: 粒子束处理装置包括使粒子束沿与前进方向正交的方向移动的照射喷嘴; 测量粒子束剂量的剂量监测器; 将照射剂量设定在目标体积上的规划部分; 以及控制部，其基于由所述剂量监视器和所述规划部测量的值设定的照射剂量设定值来控制施加于目标体积的照射剂量，其中，所述规划部将所述吸收剂量分布数据存储在所述深度方向 其预先使用在比布拉格峰位置作为基准更靠近粒子束的入射侧的预定位置处的参考深度处的吸收剂量来计算，并且使用参考的吸收剂量来计算照射剂量设定值 深度。

公开(公告)号：US08854048B2

公开(公告)日：2014-10-07

申请号：US13262866

申请日：2011-03-10

Applicant: Toshihiro Otani ,  Hisashi Harada ,  Masahiro Ikeda ,  Kazushi Hanakawa ,  Taizo Honda

Inventor： Toshihiro Otani ,  Hisashi Harada ,  Masahiro Ikeda ,  Kazushi Hanakawa ,  Taizo Honda

IPC: G01N27/62 ,  A61N5/10

CPC classification number: H01J37/304 ,  A61N5/1048 ,  A61N5/1071 ,  A61N5/1077 ,  A61N2005/1087 ,  H01J47/02

Abstract: In a particle beam therapy system which scans a particle beam and irradiates the particle beam to an irradiation position of an irradiation subject and has a dose monitoring device for measuring a dose of the particle beam and an ionization chamber smaller than the dose monitoring device, the ionization chamber measuring a dose of a particle beam passing through the dose monitoring device, the dose of the particle beam irradiated by the dose monitoring device is measured; the dose of the particle beam passing through the dose monitoring device is measured by the small ionization chamber; and a correction coefficient of the dose measured by the dose monitoring device corresponding to the irradiation position is found based on the dose of the particle beam measured by the small ionization chamber.

Abstract translation: 在粒子束治疗系统中，扫描粒子束并将粒子束照射到照射对象的照射位置，并且具有用于测量粒子束的剂量和小于剂量监测装置的电离室的剂量监测装置， 电离室测量通过剂量监测装置的粒子束的剂量，测量由剂量监测装置照射的粒子束的剂量; 通过小电离室测量通过剂量监测装置的粒子束的剂量; 并且基于由小电离室测量的粒子束的剂量，求出由与照射位置对应的剂量监测装置测量的剂量的校正​​系数。

公开(公告)号：US09101763B2

公开(公告)日：2015-08-11

申请号：US14240650

申请日：2011-11-03

Applicant: Masahiro Ikeda ,  Hisashi Harada ,  Kazushi Hanakawa ,  Toshihiro Otani ,  Tadashi Katayose ,  Taizo Honda ,  Yukiko Yamada ,  Yuehu Pu

Inventor： Masahiro Ikeda ,  Hisashi Harada ,  Kazushi Hanakawa ,  Toshihiro Otani ,  Tadashi Katayose ,  Taizo Honda ,  Yukiko Yamada ,  Yuehu Pu

IPC: A61N5/00 ,  A61N5/10

CPC classification number: A61N5/1081 ,  A61N5/1077 ,  A61N2005/1087 ,  A61N2005/1095

Abstract: A particle beam irradiation apparatus according to the present invention is provided with a vacuum duct that forms a vacuum region through which the charged particle beam passes, a vacuum window through which the charged particle beam is launched from the vacuum region, a scanning electromagnet that scans the charged particle beam; a monitoring apparatus including a position monitor that detects the passing position of a charged particle beam and the beam size thereof, a low-scattering gas filling chamber including the monitoring apparatus, and an irradiation management apparatus that controls irradiation of the charged particle beam; the particle beam irradiation apparatus is characterized in that the low-scattering gas filling chamber is changeably disposed in such a manner that the beam-axis-direction positional relationship between the monitoring apparatus and the vacuum window is a desired one and in that the low-scattering gas filling chamber is filled with a low-scattering gas.

Abstract translation: 根据本发明的粒子束照射装置设置有真空管道，该真空管道形成带电粒子束通过的真空区域，从真空区域发射带电粒子束的真空窗口，扫描的扫描电磁体 带电粒子束; 监视装置，其包括检测带电粒子束的通过位置的位置监视器及其光束尺寸，包括监视装置的低散射气体填充室以及控制带电粒子束的照射的照射管理装置; 所述粒子束照射装置的特征在于，所述低散射气体充填室可变地设置成使得所述监视装置和所述真空窗口之间的射束轴向位置关系是期望的， 散射气体填充室填充有低散射气体。

公开(公告)号：US09067065B2

公开(公告)日：2015-06-30

申请号：US13977058

申请日：2011-03-07

Applicant: Yukiko Yamada ,  Hisashi Harada ,  Takaaki Iwata ,  Toshihiro Otani ,  Masahiro Ikeda ,  Kazushi Hanakawa ,  Taizo Honda

Inventor： Yukiko Yamada ,  Hisashi Harada ,  Takaaki Iwata ,  Toshihiro Otani ,  Masahiro Ikeda ,  Kazushi Hanakawa ,  Taizo Honda

IPC: A61N5/10 ,  G21K1/093

CPC classification number: A61N5/1048 ,  A61N5/1043 ,  A61N5/1075 ,  A61N2005/1087 ,  G21K1/093

Abstract: The particle beam irradiation apparatus comprises: a position monitor that detects a passing position of a charged particle beam; and an irradiation control apparatus that calculates a distance from a predetermined reference point to the position monitor, calculates a beam irradiation position on an irradiation subject, and controls irradiation of the beam; wherein the irradiation control apparatus includes a position calculation apparatus that calculates the beam irradiation position, based on a beam position detected by the position monitor, a scanning starting point distance information on a distance from a irradiation plane of the irradiation subject to a scanning starting point, of the beam, in a scanning electromagnet, and a position monitor distance information on a distance, from the irradiation plane to the position monitor, that is calculated based on the calculated distance.

Abstract translation: 粒子束照射装置包括：位置监视器，其检测带电粒子束的通过位置; 以及照射控制装置，其计算从预定基准点到所述位置监视器的距离，计算照射对象的光束照射位置，并控制所述光束的照射; 其特征在于，所述照射控制装置包括：位置计算装置，其基于由所述位置监视器检测到的光束位置计算所述光束照射位置;从所述照射对象的照射面到扫描开始点的距离的扫描开始点距离信息 ，扫描电磁体中的距离信息，以及从照射平面到位置监视器的基于计算出的距离计算的位置监视距离信息。

公开(公告)号：US20140323793A1

公开(公告)日：2014-10-30

申请号：US14356629

申请日：2012-03-27

Applicant: Yukiko Yamada ,  Hisashi Harada ,  Taizo Honda ,  Masahiro Ikeda ,  Kazushi Hanakawa ,  Toshihiro Otani ,  Tadashi Katayose

Inventor： Yukiko Yamada ,  Hisashi Harada ,  Taizo Honda ,  Masahiro Ikeda ,  Kazushi Hanakawa ,  Toshihiro Otani ,  Tadashi Katayose

IPC: A61N5/10

CPC classification number: A61N5/1048 ,  A61N5/1043 ,  A61N5/1077 ,  A61N2005/1074 ,  A61N2005/1087 ,  H05H13/04 ,  H05H2277/11

Abstract: A control unit is provided with, a retaining section that retains a plurality of operation patterns each being a pattern of operation to be periodically repeated by an accelerator, the operation patterns having respective operation conditions adjusted for different emission times of an particle beam, to cause a deflection electromagnet in the accelerator to have an intended magnetic field intensity even under a presence of a hysteresis; a reading section for a plurality of slices of an irradiation target in a depth direction, which reads an irradiation condition for each of the slices; a selection section that selects the operation pattern suitable for each of the slices, on the basis of the read irradiation condition; and a main control section that controls, for each of the slices, the accelerator on the basis of the selected operation pattern and an irradiation device on the basis of the irradiation condition.

Abstract translation: 控制单元设置有保持部，其保持多个操作模式，每个操作模式是由加速器周期性重复的操作模式，所述操作模式具有针对粒子束的不同发射次数调整的各自的操作条件，以使得 加速器中的偏转电磁体即使在滞后的情况下也具有预期的磁场强度; 用于读取每个切片的照射条件的用于在深度方向上的照射目标的多个切片的读取部分; 选择部，其基于读取的照射条件选择适合于每个切片的操作模式; 以及主控制部，其基于所述照射条件，基于所选择的操作模式和照射装置对每个切片进行加速器的控制。

公开(公告)号：US08586942B2

公开(公告)日：2013-11-19

申请号：US13639998

申请日：2012-01-20

Applicant: Taizo Honda ,  Hisashi Harada ,  Yuehu Pu ,  Masahiro Ikeda ,  Kazushi Hanakawa ,  Toshihiro Otani ,  Tadashi Katayose ,  Yukiko Yamada

Inventor： Taizo Honda ,  Hisashi Harada ,  Yuehu Pu ,  Masahiro Ikeda ,  Kazushi Hanakawa ,  Toshihiro Otani ,  Tadashi Katayose ,  Yukiko Yamada

IPC: H01J3/10

CPC classification number: A61N5/1048 ,  A61N5/1043 ,  A61N5/1071 ,  A61N2005/1074 ,  A61N2005/1087 ,  G01T1/29 ,  G21K5/00 ,  G21K5/02

Abstract: A charged particle beam position monitor is provided with a plurality of position monitors and a beam data processing device that performs calculation processing of the state of a charged particle beam, based on a plurality of signals outputted from the position monitors. The beam data processing device includes a plurality of channel data conversion units that perform AD conversion processing of the plurality of signals outputted from the position monitors; a position size processing unit, for each of the position monitors, that calculates the beam position of the beam, based on voltage information obtained through the AD conversion processing; and an integrated control unit that controls the plurality of channel data conversion units in such a way that while the beam is irradiated onto an irradiation subject, AD conversion processing of the signals is performed at different timings for the respective position monitors.

Abstract translation: 带电粒子束位置监视器具有多个位置监视器和根据从位置监视器输出的多个信号执行带电粒子束的状态的计算处理的波束数据处理装置。 所述波束数据处理装置包括对从所述位置监视器输出的所述多个信号进行AD转换处理的多个信道数据变换部; 基于通过AD转换处理获得的电压信息，对位置监视器中的每一个计算光束位置的位置尺寸处理单元; 以及集成控制单元，其以这样的方式控制多个通道数据转换单元，即当将光束照射到照射对象时，对于各个位置监视器，在不同的定时执行信号的AD转换处理。

公开(公告)号：US20130274538A1

公开(公告)日：2013-10-17

申请号：US13977058

申请日：2011-03-07

Applicant: Yukiko Yamada ,  Hisashi Harada ,  Takaaki Iwata ,  Toshihiro Otani ,  Masahiro Ikeda ,  Kazushi Hanakawa ,  Taizo Honda

Inventor： Yukiko Yamada ,  Hisashi Harada ,  Takaaki Iwata ,  Toshihiro Otani ,  Masahiro Ikeda ,  Kazushi Hanakawa ,  Taizo Honda

IPC: A61N5/10

CPC classification number: A61N5/1048 ,  A61N5/1043 ,  A61N5/1075 ,  A61N2005/1087 ,  G21K1/093

Abstract: The particle beam irradiation apparatus comprises: a position monitor that detects a passing position of a charged particle beam; and an irradiation control apparatus that calculates a distance from a predetermined reference point to the position monitor, calculates a beam irradiation position on an irradiation subject, and controls irradiation of the beam; wherein the irradiation control apparatus includes a position calculation apparatus that calculates the beam irradiation position, based on a beam position detected by the position monitor, a scanning starting point distance information on a distance from a irradiation plane of the irradiation subject to a scanning starting point, of the beam, in a scanning electromagnet, and a position monitor distance information on a distance, from the irradiation plane to the position monitor, that is calculated based on the calculated distance.

Abstract translation: 粒子束照射装置包括：位置监视器，其检测带电粒子束的通过位置; 以及照射控制装置，其计算从预定基准点到所述位置监视器的距离，计算照射对象的光束照射位置，并控制所述光束的照射; 其特征在于，所述照射控制装置包括：位置计算装置，其基于由所述位置监视器检测到的光束位置计算所述光束照射位置;从所述照射对象的照射面到扫描开始点的距离的扫描开始点距离信息 ，扫描电磁体中的距离信息，以及从照射平面到位置监视器的基于计算出的距离计算的位置监视距离信息。