发明申请
- 专利标题: SALT, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN
- 专利标题(中): 盐,光电组合物和生产光电子图案的方法
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申请号: US13443175申请日: 2012-04-10
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公开(公告)号: US20120328986A1公开(公告)日: 2012-12-27
- 发明人: Yukako ANRYU , Koji ICHIKAWA
- 申请人: Yukako ANRYU , Koji ICHIKAWA
- 申请人地址: JP Tokyo
- 专利权人: SUMITOMO CHEMICAL COMPANY, LIMITED
- 当前专利权人: SUMITOMO CHEMICAL COMPANY, LIMITED
- 当前专利权人地址: JP Tokyo
- 优先权: JP2011-088881 20110413
- 主分类号: C07C309/19
- IPC分类号: C07C309/19 ; C07D333/22 ; C07C69/96 ; G03F7/027 ; G03F7/20
摘要:
A salt represented by formula (I): wherein Q1 and Q2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, n represents 0 or 1, Ll represents a single bond or a C1-C10 alkanediyl group in which a methylene group may be replaced by an oxygen atom or carbonyl group, provided that Ll is not a single bond when n is 0, ring W represents a C3-C36 aliphatic ring in which a methylene group may be replaced by an oxygen atom, a sulfur atom, a carbonyl group or a sulfonyl group and in which a hydrogen atom may be replaced by a hydroxyl group, a C1-C12 alkyl group or a C1-C12 alkoxy group, Rl represents a hydroxyl group or a hydroxyl group protected by a protecting group, and Z+ represents an organic cation.