发明申请
US20130005993A1 NOVEL DIARYL SULFONE COMPOUND, AND MANUFACTURING METHOD FOR SAME
有权
新型DIARYL SULFONE化合物及其制造方法
- 专利标题： NOVEL DIARYL SULFONE COMPOUND, AND MANUFACTURING METHOD FOR SAME
- 专利标题（中）： 新型DIARYL SULFONE化合物及其制造方法
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申请号： US13583725申请日： 2011-03-09
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公开(公告)号： US20130005993A1公开(公告)日： 2013-01-03
- 发明人: Paul Kuad , Hisaaki Kanda , Takeshi Fujiwara , Hiroyuki Shiraishi
- 申请人： Paul Kuad , Hisaaki Kanda , Takeshi Fujiwara , Hiroyuki Shiraishi
- 申请人地址： JP Kako-gun
- 专利权人： Sumitomo Seika Chemicals Co., Ltd.
- 当前专利权人： Sumitomo Seika Chemicals Co., Ltd.
- 当前专利权人地址： JP Kako-gun
- 优先权： JP2010-062865 20100318; JP2010-062875 20100318; JP2010-064011 20100319; JP2010-064031 20100319
- 国际申请： PCT/JP2011/055452 WO 20110309
- 主分类号： C07D405/12
- IPC分类号： C07D405/12 ; C07C315/04 ; C07C321/28 ; C07C319/02 ; C07D409/12 ; C07C317/24
摘要：
The present invention provides a diaryl sulfone compound represented by Formula (1) below: wherein R1 to R4 and R1′ to R4′ are the same or different; each represents hydrogen, C1-4 alkyl, or halogen; and R5 is (thio)glycidyl, acryloyl, or the like; and a method for producing the same.According to the present invention, a novel compound useful as a monomer for producing synthetic resin having a high refractive index and excellent transparency for optical materials can be efficiently produced with a simple production process, using an inexpensive material as a starting material.
公开/授权文献
- US09040724B2 Diaryl sulfone compound, and manufacturing method for same 公开/授权日：2015-05-26
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