发明申请
- 专利标题： CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
- 专利标题（中）： 化学放大正电阻组合物和图案化方法
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申请号： US13556422申请日： 2012-07-24
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公开(公告)号： US20130026044A1公开(公告)日： 2013-01-31
- 发明人: Hiroyuki Yasuda , Katsuya Takemura
- 申请人： Hiroyuki Yasuda , Katsuya Takemura
- 申请人地址： JP Tokyo
- 专利权人： SHIN-ETSU CHEMICAL CO., LTD.
- 当前专利权人： SHIN-ETSU CHEMICAL CO., LTD.
- 当前专利权人地址： JP Tokyo
- 优先权： JP2011-161860 20110725
- 主分类号： G03F7/027
- IPC分类号： G03F7/027 ; C25D5/02 ; G03F7/20
摘要：
A chemically amplified positive resist composition is provided comprising an alkali-insoluble or substantially alkali-insoluble polymer having an acid labile group-protected acidic functional group, an alkyl vinyl ether polymer, a photoacid generator, and a benzotriazole compound in a solvent. The composition forms on a substrate a resist film of 5-100 μm thick which can be briefly developed to form a pattern at a high sensitivity and a high degree of removal or dissolution to bottom.
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