发明申请
- 专利标题： PLASMA PROCESSING OF WORKPIECES TO FORM A COATING
- 专利标题（中）： 工件的等离子体处理形成涂层
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申请号： US13608709申请日： 2012-09-10
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公开(公告)号： US20130064989A1公开(公告)日： 2013-03-14
- 发明人: Christopher R. Hatem , Ludovic Godet , Louis Steen , Deepak A. Ramappa
- 申请人： Christopher R. Hatem , Ludovic Godet , Louis Steen , Deepak A. Ramappa
- 申请人地址： US MA Gloucester
- 专利权人： VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.
- 当前专利权人： VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.
- 当前专利权人地址： US MA Gloucester
- 主分类号： C23C14/48
- IPC分类号： C23C14/48
摘要：
A surface of an insulating workpiece is implanted to form either hydrophobic or hydrophilic implanted regions. A conductive coating is deposited on the workpiece. The coating may be a polymer in one instance. This coating preferentially forms either on the implanted regions if these implanted regions are hydrophilic or on the non-implanted regions if the implanted regions are hydrophobic.
公开/授权文献
- US09062367B2 Plasma processing of workpieces to form a coating 公开/授权日：2015-06-23
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