发明申请
- 专利标题: MICROMATERIAL STRAIN MEASUREMENT APPARATUS AND METHOD THEREFOR TECHINICAL FIELD
- 专利标题(中): 微生物菌株测定装置及其技术方法
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申请号: US13701402申请日: 2011-06-01
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公开(公告)号: US20130068034A1公开(公告)日: 2013-03-21
- 发明人: Kazuki Takashima , Masaaki Otsu , Mitsuhiro Matsuda , Hiroaki Kurahara , Hidetaka Maeda , Tadahiro Yonekura
- 申请人: Kazuki Takashima , Masaaki Otsu , Mitsuhiro Matsuda , Hiroaki Kurahara , Hidetaka Maeda , Tadahiro Yonekura
- 申请人地址: JP Hidaka-shi, Saitama JP Kumamoto-shi, Kumamoto
- 专利权人: SIGMA KOKI CO., LTD.,KUMAMOTO UNIVERSITY
- 当前专利权人: SIGMA KOKI CO., LTD.,KUMAMOTO UNIVERSITY
- 当前专利权人地址: JP Hidaka-shi, Saitama JP Kumamoto-shi, Kumamoto
- 优先权: JP2010-127109 20100602
- 国际申请: PCT/JP2011/062565 WO 20110601
- 主分类号: G01L1/24
- IPC分类号: G01L1/24
摘要:
A measurement unit for tensile or compressive stress can includes a CCD camera for detecting an interference light, the interference light being formed with a measurement beam from a measured region and a reference beam from a reference mirror. A first objective lens can have the reference mirror. An image processing apparatus can measure the three-dimensional shape of the measured region from the position of the first objective lens at which the interference light provides the maximum contrast and can measure the distance between two gauge points on the basis of the three-dimensional shape. When strain is generated on a micromaterial, the strain against the measured tensile stress is measured on the basis of the tensile stress and the distance between the two gauge points.