发明申请
- 专利标题: GRAPHENE DEFECT DETECTION
- 专利标题(中): 石墨缺陷检测
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申请号: US13496064申请日: 2011-09-16
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公开(公告)号: US20130071941A1公开(公告)日: 2013-03-21
- 发明人: Seth A. Miller
- 申请人: Seth A. Miller
- 申请人地址: US DE WILMINGTON
- 专利权人: EMPIRE TECHNOLOGY DEVELOPMENT LLC
- 当前专利权人: EMPIRE TECHNOLOGY DEVELOPMENT LLC
- 当前专利权人地址: US DE WILMINGTON
- 国际申请: PCT/US11/51876 WO 20110916
- 主分类号: G01N31/00
- IPC分类号: G01N31/00
摘要:
Technologies are generally described for a method and system configured effective to detect a defect in a sample including graphene. An example method may include receiving a sample, where the sample may include at least some graphene and at least some defects in the graphene. The method may further include exposing the sample to a gas under sufficient reaction conditions to produce a marked sample, where the marked sample may include marks bonded to at least some of the defects. The method may further include placing the marked sample in a detector system. The method may also include detecting at least some of the marks with the detector system.
公开/授权文献
- US09091634B2 Graphene defect detection 公开/授权日:2015-07-28
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