发明申请
- 专利标题： Lithographic Apparatus and Substrate Handling Method
- 专利标题（中）： 平版印刷设备和基板处理方法
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申请号： US13597831申请日： 2012-08-29
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公开(公告)号： US20130077078A1公开(公告)日： 2013-03-28
- 发明人: Raymond Wilhelmus Louis LAFARRE , Sjoerd Nicolaas Lambertus Donders , Antonius Franciscus Johannes De Groot , Hubert Marie Segers , Johannes Petrus Martinus Bernardus Vermeulen , Raimond Visser , Johannes Charles Adrianus Van Den Berg , Jan Steven Christiaan Westerlaken , Yang-Shan Huang , Christiaan Louis Valentin
- 申请人： Raymond Wilhelmus Louis LAFARRE , Sjoerd Nicolaas Lambertus Donders , Antonius Franciscus Johannes De Groot , Hubert Marie Segers , Johannes Petrus Martinus Bernardus Vermeulen , Raimond Visser , Johannes Charles Adrianus Van Den Berg , Jan Steven Christiaan Westerlaken , Yang-Shan Huang , Christiaan Louis Valentin
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： G03B27/58
- IPC分类号： G03B27/58
摘要：
A lithographic apparatus comprises a substrate table constructed to hold a substrate and a gripper arranged to position the substrate on the substrate table. The gripper includes an electrostatic clamp arranged to clamp the substrate at a top side thereof. The electrostatic clamp is arranged to clamp at least part of a circumferential outer zone of a top surface of the substrate. The invention provides a substrate handling method including positioning the substrate by means of a gripper on a substrate table of a lithographic apparatus. The substrate is clamped at a top side thereof by using an electrostatic clamp of the gripper.
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