发明申请
US20130078433A1 ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM USING THE SAME, PATTERN FORMING METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, AND ELECTRONIC DEVICE, EACH USING THE SAME
有权
化学敏感性或辐射敏感性树脂组合物，使用它们的耐光膜，图案形成方法，电子设备制造方法和电子设备，每个使用它们
- 专利标题： ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM USING THE SAME, PATTERN FORMING METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, AND ELECTRONIC DEVICE, EACH USING THE SAME
- 专利标题（中）： 化学敏感性或辐射敏感性树脂组合物，使用它们的耐光膜，图案形成方法，电子设备制造方法和电子设备，每个使用它们
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申请号： US13614797申请日： 2012-09-13
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公开(公告)号： US20130078433A1公开(公告)日： 2013-03-28
- 发明人: Kaoru IWATO , Hidenori TAKAHASHI , Michihiro SHIRAKAWA
- 申请人： Kaoru IWATO , Hidenori TAKAHASHI , Michihiro SHIRAKAWA
- 申请人地址： JP Tokyo
- 专利权人： FUJIFILM CORPORATION
- 当前专利权人： FUJIFILM CORPORATION
- 当前专利权人地址： JP Tokyo
- 优先权： JP2011-207018 20110922
- 主分类号： G03F7/038
- IPC分类号： G03F7/038 ; B32B3/10 ; G03F7/20
摘要：
Provided are an actinic-ray-sensitive or a radiation-sensitive resin composition with greater residual film ratio and capable of suppressing pattern collapse and an occurrence of bridge defects after development, and a resist film, a pattern forming method, an electronic device manufacturing method, and an electronic device, each using the same. An actinic-ray-sensitive or radiation-sensitive resin composition includes a resin (P) having a repeating unit (a) represented by following General Formula (I), a compound (B) represented by any of following General Formulae (B-1) to (B-3), and a solvent, in General Formula (I), R0 represents a hydrogen atom or a methyl group, and R1, R2 and R3 each independently represent a straight chain or branched alkyl group.
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