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    Infusion pump
    1.
    发明授权
    Infusion pump 有权
    输液泵

    公开(公告)号：US09463275B2

    公开(公告)日：2016-10-11

    申请号：US14346828

    申请日：2012-09-11

    申请人： Mitsutaka Ueda ,  Ryoichi Akai ,  Hidenori Takahashi

    发明人： Mitsutaka Ueda ,  Ryoichi Akai ,  Hidenori Takahashi

    IPC分类号： A61M1/00 ,  A61M5/168 ,  A61M5/142 ,  F04B43/08

    CPC分类号： A61M5/16813 ,  A61M5/14212 ,  A61M5/14224 ,  A61M5/14228 ,  F04B43/082

    摘要： An infusion pump has a primary finger with an inclined surface, which is obliquely inclined to an advancing and retracting direction, and a secondary finger with an inclined surface, which is slidable relative to the inclined surface of the primary finger. When the primary finger is advanced, the secondary finger is retracted in proportion to the variation (increasing) in an entire width of an infusion tube, and when the primary finger is retracted, the secondary finger is advanced in proportion the variation (decreasing) in the entire width of the infusion tube. This configuration can suppress the occurrence of any gap between a tip surface of the secondary finger and an outer peripheral surface of the infusion tube in the advancing and retracting process of the primary finger. Consequently, this prevents the infusion tube from meandering, and suppresses the reduction in the accuracy of the rate of infusion.

    摘要翻译： 输液泵具有主指状物，其具有倾斜的倾斜表面，其倾斜地朝向前进和后退方向，以及具有相对于主指状物的倾斜表面可滑动的倾斜表面的次级手指。 当主指状物前进时，辅助手指与输液管的整个宽度的变化（增加）成比例地缩回，并且当主指缩回时，次级手指按比例（递减） 输液管的整个宽度。 这种构造可以抑制在主指的前进和缩回过程中二次手指的尖端表面和输注管的外周表面之间的任何间隙的发生。 因此，能够防止输液管曲折，能够抑制输液速度的精度降低。

    INHIBITORS OF LEUKOTRIENE PRODUCTION
    3.
    发明申请
    INHIBITORS OF LEUKOTRIENE PRODUCTION 有权
    白藜芦素生产抑制剂

    公开(公告)号：US20150018333A1

    公开(公告)日：2015-01-15

    申请号：US14330297

    申请日：2014-07-14

    申请人： Asitha ABEYWARDANE ,  John BROADWATER ,  Hidenori TAKAHASHI

    发明人： Asitha ABEYWARDANE ,  John BROADWATER ,  Hidenori TAKAHASHI

    IPC分类号： C07D401/14 ,  A61K31/4709 ,  A61K31/496

    CPC分类号： C07D401/14 ,  A61K31/4709 ,  A61K31/496

    摘要： The present invention relates to compounds of formula (I): or a pharmaceutically acceptable salt thereof, wherein R1 is defined herein. The compounds of formula (I) are useful as inhibitors of leukotriene A4 hydrolase (LTA4H) and treating LTA4H related disorders. The present invention also relates to pharmaceutical compositions comprising the compounds of formula (I), methods of using these compounds in the treatment of various diseases and disorders, and processes for preparing these compounds.

    摘要翻译： 本发明涉及式（I）化合物或其药学上可接受的盐，其中R 1在本文中定义。 式（I）化合物可用作白三烯A4水解酶（LTA4H）的抑制剂和治疗LTA4H相关疾病。 本发明还涉及包含式（I）化合物的药物组合物，使用这些化合物治疗各种疾病和病症的方法，以及制备这些化合物的方法。

    ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM, PATTERN FORMING METHOD, METHOD FOR PREPARING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE, EACH USING THE SAME
    9.
    发明申请
    ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM, PATTERN FORMING METHOD, METHOD FOR PREPARING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE, EACH USING THE SAME 有权
    化学敏感性或辐射敏感性树脂组合物，耐蚀膜，图案形成方法，制备电子器件的方法和使用其的电子器件

    公开(公告)号：US20130078426A1

    公开(公告)日：2013-03-28

    申请号：US13610271

    申请日：2012-09-11

    申请人： Kosuke KOSHIJIMA ,  Hidenori TAKAHASHI ,  Shuhei YAMAGUCHI ,  Kei YAMAMOTO

    发明人： Kosuke KOSHIJIMA ,  Hidenori TAKAHASHI ,  Shuhei YAMAGUCHI ,  Kei YAMAMOTO

    IPC分类号： G03F7/075 ,  B32B3/30 ,  G03F7/20

    CPC分类号： G03F7/325 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/0755 ,  G03F7/0758 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/40 ,  Y10T428/24479

    摘要： An actinic ray-sensitive or radiation-sensitive resin composition capable of forming a hole pattern which has an ultrafine pore diameter (for example, 60 nm or less) and has an excellent cross-sectional shape with excellent local pattern dimensional uniformity; and a resist film, a pattern forming method, a method for preparing an electronic device, and an electronic device, each using the same, are provided.The actinic ray-sensitive or radiation-sensitive resin composition includes (P) a resin containing 30 mol % or more of a repeating unit (a) represented by the following general formula (I) based on all the repeating units; (B) a compound capable of generating an acid upon irradiation of actinic rays or radiation; and (G) a compound having at least one of a fluorine atom and a silicon atom, and further having basicity or being capable of increasing the basicity by an action of an acid:

    摘要翻译： 能够形成具有超细孔径（例如60nm以下）的孔图案并且具有优异的局部图案尺寸均匀性的截面形状优异的光化射线敏感或辐射敏感性树脂组合物; 并且提供了各自使用它们的抗蚀剂膜，图案形成方法，制备电子设备的方法和电子设备。 光化射线敏感性或辐射敏感性树脂组合物包含（P）基于所有重复单元含有30mol％以上由以下通式（I）表示的重复单元（a）的树脂的树脂; （B）能够在光化射线或辐射照射时能产生酸的化合物; 和（G）具有氟原子和硅原子中的至少一个的化合物，并且还具有碱性或能够通过酸的作用增加碱度：

    PATTERN FORMING METHOD AND ACTINIC-RAY- OR RADIATION-SENSTIVE RESIN COMPOSITION
    10.
    发明申请
    PATTERN FORMING METHOD AND ACTINIC-RAY- OR RADIATION-SENSTIVE RESIN COMPOSITION 有权
    图案形成方法和丙烯酰胺或辐射敏感性树脂组合物

    公开(公告)号：US20130040096A1

    公开(公告)日：2013-02-14

    申请号：US13642751

    申请日：2011-05-20

    申请人： Kaoru Iwato ,  Hidenori Takahashi ,  Shuji Hirano ,  Sou Kamimura ,  Keita Kato

    发明人： Kaoru Iwato ,  Hidenori Takahashi ,  Shuji Hirano ,  Sou Kamimura ,  Keita Kato

    IPC分类号： G03F7/039 ,  H01L21/027 ,  G03F7/20

    CPC分类号： G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/0758 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/325 ,  G03F7/40 ,  Y10T428/24

    摘要： Provided is a method of forming a pattern and an actinic-ray- or radiation-sensitive resin composition that excels in the limiting resolving power, roughness characteristics, exposure latitude (EL) and bridge defect performance. The method of forming a pattern includes (1) forming an actinic-ray- or radiation-sensitive resin composition into a film, (2) exposing the film to light, and (3) developing the exposed film with a developer containing an organic solvent. The actinic-ray- or radiation-sensitive resin composition contains (A) a resin containing a repeating unit with a structural moiety that is configured to decompose when exposed to actinic rays or radiation to thereby generate an acid, and (B) a solvent.

    摘要翻译： 提供了形成极限分辨能力，粗糙度特性，曝光宽容度（EL）和桥梁缺陷性能优异的图案和光化射线或辐射敏感性树脂组合物的方法。 形成图案的方法包括（1）将光化学射线或辐射敏感性树脂组合物形成膜，（2）将膜曝光，和（3）用含有机溶剂的显影剂显影曝光膜 。 所述光化学射线或辐射敏感性树脂组合物含有（A）含有具有结构部分的重复单元的树脂，所述结构部分被配置为当暴露于光化射线或辐射时分解从而产生酸，和（B）溶剂。