发明申请
- 专利标题: Plasma Tuning Rods in Microwave Resonator Plasma Sources
- 专利标题(中): 微波谐振器等离子体源中的等离子体调谐棒
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申请号: US13249560申请日: 2011-09-30
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公开(公告)号: US20130082030A1公开(公告)日: 2013-04-04
- 发明人: Jianping Zhao , Lee Chen , Merritt Funk , Toshihiko Iwao , Peter L.G. Ventzek
- 申请人: Jianping Zhao , Lee Chen , Merritt Funk , Toshihiko Iwao , Peter L.G. Ventzek
- 申请人地址: JP Tokyo
- 专利权人: TOKYO ELECTRON LIMITED
- 当前专利权人: TOKYO ELECTRON LIMITED
- 当前专利权人地址: JP Tokyo
- 主分类号: C23F1/00
- IPC分类号: C23F1/00 ; C23F1/08
摘要:
The invention provides a plurality of resonator subsystems. The resonator subsystems can comprise one or more resonant cavities configured to couple electromagnetic (EM) energy in a desired EM wave mode to plasma by generating resonant microwave energy in a resonant cavity adjacent the plasma. The resonator subsystem can be coupled to a process chamber using one or more interface subsystems and can comprise one or more resonant cavities, and each resonant cavity can have a plurality of plasma tuning rods coupled thereto. Some of the plasma tuning rods can be configured to couple the EM-energy from one or more of the resonant cavities to the process space within the process chamber.
公开/授权文献
- US09111727B2 Plasma tuning rods in microwave resonator plasma sources 公开/授权日:2015-08-18
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