发明申请
- 专利标题： GAS FIELD IONIZATION ION SOURCE, SCANNING CHARGED PARTICLE MICROSCOPE, OPTICAL AXIS ADJUSTMENT METHOD AND SPECIMEN OBSERVATION METHOD
- 专利标题（中）： 气体离子源，扫描粒子微量元素，光轴调整方法和样本观测方法
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申请号： US13624607申请日： 2012-09-21
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公开(公告)号： US20130087704A1公开(公告)日： 2013-04-11
- 发明人: Tohru ISHITANI , Yoichi OSE , Hiroyasu SHICHI , Shinichi MATSUBARA , Tomihiro HASHIZUME , Muneyuki FUKUDA
- 申请人： Hitachi High-Technologies Corporation
- 申请人地址： JP Tokyo
- 专利权人： HITACHI HIGH-TECHNOLOGIES CORPORATION
- 当前专利权人： HITACHI HIGH-TECHNOLOGIES CORPORATION
- 当前专利权人地址： JP Tokyo
- 优先权： JP2007-322703 20071214
- 主分类号： H01J37/285
- IPC分类号： H01J37/285 ; H01J27/26
摘要：
A gas field ionization ion source (GFIS) is characterized in that the aperture diameter of the extraction electrode can be set to any of at least two different values or the distance from the apex of the emitter to the extraction electrode can be set to any of at least two different values. In addition, solid nitrogen is used for cooling. It may be possible to not only let divergently emitted ions go through the aperture of the extraction electrode but also, in behalf of differential pumping, reduce the diameter of the aperture. In addition, it may be possible to reduce the physical vibration of the cooling means. Consequently, it may be possible to provide a highly stable GFIS and a scanning charged particle microscope equipped with such a GFIS.
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