Invention Application
- Patent Title: ARC EVAPORATION SOURCE HAVING FAST FILM-FORMING SPEED, COATING FILM MANUFACTURING METHOD AND FILM FORMATION APPARATUS USING THE ARC EVAPORATION SOURCE
- Patent Title (中): 具有快速成膜速度的ARC蒸发源，涂膜生产方法和使用ARC蒸发源的膜形成装置
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Application No.: US13805259Application Date: 2011-06-15
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Publication No.: US20130098881A1Publication Date: 2013-04-25
- Inventor: Shinichi Tanifuji , Kenji Yamamoto , Homare Nomura , Yoshinori Kurokawa , Naoyuki Goto
- Applicant: Shinichi Tanifuji , Kenji Yamamoto , Homare Nomura , Yoshinori Kurokawa , Naoyuki Goto
- Applicant Address: JP Kobe-shi
- Assignee: Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.)
- Current Assignee: Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.)
- Current Assignee Address: JP Kobe-shi
- Priority: JP2010-142614 20100623; JP2010-201946 20100909
- International Application: PCT/JP2011/003403 WO 20110615
- Main IPC: B23K9/00
- IPC: B23K9/00
Abstract:
An arc evaporation source having fast film-forming speed includes: at least one circumference magnet surrounding the circumference of a target, wherein the magnetization direction of the magnet runs orthogonal to the target surface; a non-ring shaped first permanent magnet on the target's rear surface side has a polarity in the same direction as the circumference magnet, and is arranged so that its magnetization direction runs orthogonal to the target's surface; a non-ring shaped second permanent magnet arranged either on the rear surface side of the first permanent magnet or between the first permanent magnet and the target, so as to leave a gap from the first permanent magnet, has a polarity in the same direction as the circumference magnet, and is arranged so that its magnetization direction runs orthogonal to the surface of the target; and a magnetic body between the first permanent magnet and the second permanent magnet.
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