公开(公告)号：US09211570B2

公开(公告)日：2015-12-15

申请号：US13697710

申请日：2011-05-16

申请人： Naoyuki Goto ,  Homare Nomura ,  Shigeto Adachi ,  Koumei Fujioka

发明人： Naoyuki Goto ,  Homare Nomura ,  Shigeto Adachi ,  Koumei Fujioka

IPC分类号： B08B7/00 ,  C23C14/02 ,  C23C14/32 ,  H01J37/32

CPC分类号： B08B7/0071 ,  C23C14/022 ,  C23C14/32 ,  H01J37/32018 ,  H01J37/32027 ,  H01J37/32669 ,  H01J37/32853 ,  H01J37/32862

摘要： In an ion bombardment treatment apparatus (1A) and a cleaning method, base materials (W) to be treated are held by a work table (11) so as to be placed between a filament (3) and an anode (4) in a vacuum chamber (2), and a discharge power supply (5) which can generate a glow discharge upon the application of a potential difference between the filament (3) and the anode (4) is insulated from the vacuum chamber (2). In the ion bombardment treatment apparatus (1A) and the cleaning method, the efficiency of the cleaning of a base material can be improved and a power supply can be controlled stably.

摘要翻译： 在离子轰击处理装置（1A）和清洗方法中，待处理的基材（W）由工作台（11）保持，以将其放置在灯丝（3）和阳极（4）之间 真空室（2）和在灯丝（3）和阳极（4）之间施加电位差时可产生辉光放电的放电电源（5）与真空室（2）绝缘。 在离子轰击处理装置（1A）和清洗方法中，可以提高基材的清洁效率，并且可以稳定地控制电源。

公开(公告)号：US20130098881A1

公开(公告)日：2013-04-25

申请号：US13805259

申请日：2011-06-15

申请人： Shinichi Tanifuji ,  Kenji Yamamoto ,  Homare Nomura ,  Yoshinori Kurokawa ,  Naoyuki Goto

发明人： Shinichi Tanifuji ,  Kenji Yamamoto ,  Homare Nomura ,  Yoshinori Kurokawa ,  Naoyuki Goto

IPC分类号： B23K9/00

CPC分类号： B23K9/00 ,  C23C14/325 ,  H01J37/32055 ,  H01J37/3402

摘要： An arc evaporation source having fast film-forming speed includes: at least one circumference magnet surrounding the circumference of a target, wherein the magnetization direction of the magnet runs orthogonal to the target surface; a non-ring shaped first permanent magnet on the target's rear surface side has a polarity in the same direction as the circumference magnet, and is arranged so that its magnetization direction runs orthogonal to the target's surface; a non-ring shaped second permanent magnet arranged either on the rear surface side of the first permanent magnet or between the first permanent magnet and the target, so as to leave a gap from the first permanent magnet, has a polarity in the same direction as the circumference magnet, and is arranged so that its magnetization direction runs orthogonal to the surface of the target; and a magnetic body between the first permanent magnet and the second permanent magnet.

摘要翻译： 具有快速成膜速度的电弧蒸发源包括：围绕靶周围的至少一个圆周磁体，其中磁体的磁化方向正交于目标表面; 目标的背面侧的非环状的第一永久磁铁具有与周边磁体相同方向的极性，并且被配置为使其磁化方向与目标表面正交; 布置在第一永磁体的后表面侧或第一永磁体与靶之间以便与第一永久磁铁隔开间隙的非环形的第二永久磁铁的极性与 圆周磁体，并且被布置成使得其磁化方向垂直于靶的表面; 以及在第一永磁体和第二永磁体之间的磁体。

公开(公告)号：US20130061872A1

公开(公告)日：2013-03-14

申请号：US13697710

申请日：2011-05-16

申请人： Naoyuki Goto ,  Homare Nomura ,  Shigeto Adachi ,  Koumei Fujioka

发明人： Naoyuki Goto ,  Homare Nomura ,  Shigeto Adachi ,  Koumei Fujioka

IPC分类号： B08B7/00

CPC分类号： B08B7/0071 ,  C23C14/022 ,  C23C14/32 ,  H01J37/32018 ,  H01J37/32027 ,  H01J37/32669 ,  H01J37/32853 ,  H01J37/32862

摘要： In an ion bombardment treatment apparatus (1A) and a cleaning method, base materials (W) to be treated are held by a work table (11) so as to be placed between a filament (3) and an anode (4) in a vacuum chamber (2), and a discharge power supply (5) which can generate a glow discharge upon the application of a potential difference between the filament (3) and the anode (4) is insulated from the vacuum chamber (2). In the ion bombardment treatment apparatus (1A) and the cleaning method, the efficiency of the cleaning of a base material can be improved and a power supply can be controlled stably.

摘要翻译： 在离子轰击处理装置（1A）和清洗方法中，待处理的基材（W）由工作台（11）保持，以将其放置在灯丝（3）和阳极（4）之间 真空室（2）和在灯丝（3）和阳极（4）之间施加电位差时可产生辉光放电的放电电源（5）与真空室（2）绝缘。 在离子轰击处理装置（1A）和清洗方法中，可以提高基材的清洁效率，并且可以稳定地控制电源。

公开(公告)号：US09266180B2

公开(公告)日：2016-02-23

申请号：US13805259

申请日：2011-06-15

申请人： Shinichi Tanifuji ,  Kenji Yamamoto ,  Homare Nomura ,  Yoshinori Kurokawa ,  Naoyuki Goto

发明人： Shinichi Tanifuji ,  Kenji Yamamoto ,  Homare Nomura ,  Yoshinori Kurokawa ,  Naoyuki Goto

IPC分类号： B23K9/00 ,  C23C14/32 ,  H01J37/32 ,  H01J37/34

CPC分类号： B23K9/00 ,  C23C14/325 ,  H01J37/32055 ,  H01J37/3402

摘要： An arc evaporation source having fast film-forming speed includes: at least one circumference magnet surrounding the circumference of a target, wherein the magnetization direction of the magnet runs orthogonal to the target surface; a non-ring shaped first permanent magnet on the target's rear surface side has a polarity in the same direction as the circumference magnet, and is arranged so that its magnetization direction runs orthogonal to the target's surface; a non-ring shaped second permanent magnet arranged either on the rear surface side of the first permanent magnet or between the first permanent magnet and the target, so as to leave a gap from the first permanent magnet, has a polarity in the same direction as the circumference magnet, and is arranged so that its magnetization direction runs orthogonal to the surface of the target; and a magnetic body between the first permanent magnet and the second permanent magnet.

摘要翻译： 具有快速成膜速度的电弧蒸发源包括：围绕靶周围的至少一个圆周磁体，其中磁体的磁化方向正交于目标表面; 目标的背面侧的非环状的第一永久磁铁具有与周边磁体相同方向的极性，并且被配置为使其磁化方向与目标表面正交; 布置在第一永磁体的后表面侧或第一永磁体与靶之间以便与第一永久磁铁隔开间隙的非环形的第二永久磁铁的极性与 圆周磁体，并且被布置成使得其磁化方向垂直于靶的表面; 以及在第一永磁体和第二永磁体之间的磁体。

公开(公告)号：US5730847A

公开(公告)日：1998-03-24

申请号：US325438

申请日：1994-12-23

申请人： Koji Hanaguri ,  Kunihiko Tsuji ,  Homare Nomura ,  Hiroshi Tamagaki ,  Hiroshi Kawaguchi ,  Katsuhiko Shimojima ,  Hirofumi Fujii ,  Toshiya Kido ,  Takeshi Suzuki ,  Yoichi Inoue

发明人： Koji Hanaguri ,  Kunihiko Tsuji ,  Homare Nomura ,  Hiroshi Tamagaki ,  Hiroshi Kawaguchi ,  Katsuhiko Shimojima ,  Hirofumi Fujii ,  Toshiya Kido ,  Takeshi Suzuki ,  Yoichi Inoue

IPC分类号： C23C14/32 ,  H01J37/32 ,  H01L21/00 ,  C23C14/24

CPC分类号： H01L21/67213 ,  C23C14/325 ,  H01J37/32055 ,  H01L21/6723

摘要： The present invention relates to an arc ion plating device utilizing a vacuum arc discharge to be utilized for the surface process of works and to an arc ion plating system provided with the above-mentioned device, and the present invention offers the device and the system which are able to realize extremely high productivity by an efficient handling of works. The device according to the present invention comprises a rod-shaped evaporation source and works to be coated with a film being disposed so as to surround the rod-shaped evaporation source, The device is so constituted that the works can be moved relative to the rod-shaped evaporation source in the axial direction of the rod-shaped evaporation source.

摘要翻译： PCT No.PCT / JP94 / 00410 Sec。 371日期1994年12月23日第 102（e）日期1994年12月23日PCT 1994年3月15日PCT公布。 公开号WO94 / 21839 日期1994年9月29日本发明涉及一种利用真空电弧放电用于工程表面处理的电弧离子镀装置以及具有上述装置的电弧离子镀系统，本发明提供了 装置和系统，通过有效的处理工作能够实现极高的生产率。 根据本发明的装置包括一个棒状蒸发源，其工作原理是涂覆有围绕杆状蒸发源的薄膜。该装置的构造使得工件可以相对于杆移动 形状的蒸发源在杆状蒸发源的轴向上。