发明申请
- 专利标题: PHOTODETECTOR AND METHOD OF MANUFACTURING THE PHOTODETECTOR
- 专利标题(中): 光电转换器和制造光电转换器的方法
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申请号: US13806585申请日: 2011-06-15
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公开(公告)号: US20130099203A1公开(公告)日: 2013-04-25
- 发明人: Katsushi Akita , Takashi Ishizuka , Kei Fujii , Hideaki Nakahata , Youichi Nagai , Hiroshi Inada , Yasuhiro Iguchi
- 申请人: Katsushi Akita , Takashi Ishizuka , Kei Fujii , Hideaki Nakahata , Youichi Nagai , Hiroshi Inada , Yasuhiro Iguchi
- 申请人地址: JP Osaka-shi
- 专利权人: SUMITOMO ELECTRIC INDUSTRIES, LTD.
- 当前专利权人: SUMITOMO ELECTRIC INDUSTRIES, LTD.
- 当前专利权人地址: JP Osaka-shi
- 优先权: JP2010-147636 20100629
- 国际申请: PCT/JP2011/063630 WO 20110615
- 主分类号: H01L31/0352
- IPC分类号: H01L31/0352 ; H01L31/18
摘要:
A photodetector and a method of manufacturing the photodetector are provided, in which variation in sensitivity is suppressed over the near-infrared region from the short wavelength side including 1.3 μm to the long wavelength side. The photodetector includes, on an InP substrate, an absorption layer of a type II multiple quantum well structure comprising a repeated structure of a GaAsSb layer and an InGaAs layer, and has sensitivity in the near-infrared region including wavelengths of 1.3 μm and 2.0 μm. The ratio of the sensitivity at the wavelength of 1.3 μm to the sensitivity at the wavelength of 2.0 μm is not smaller than 0.5 but not larger than 1.6.
公开/授权文献
- US08822977B2 Photodetector and method of manufacturing the photodetector 公开/授权日:2014-09-02
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