发明申请
- 专利标题： METHOD OF FORMING PATTERN AND DEVELOPER FOR USE IN THE METHOD
- 专利标题（中）： 在方法中使用图案和开发者的方法
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申请号： US13808496申请日： 2011-08-26
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公开(公告)号： US20130113082A1公开(公告)日： 2013-05-09
- 发明人: Yuichiro Enomoto , Shinji Tarutani , Sou Kamimura , Keita Kato , Kana Fujii
- 申请人： Yuichiro Enomoto , Shinji Tarutani , Sou Kamimura , Keita Kato , Kana Fujii
- 申请人地址： JP Minato-ku, Tokyo
- 专利权人： FUJIFILM CORPORATION
- 当前专利权人： FUJIFILM CORPORATION
- 当前专利权人地址： JP Minato-ku, Tokyo
- 优先权： JP2010-191396 20100827; JP2011-182937 20110824
- 国际申请： PCT/JP2011/069968 WO 20110826
- 主分类号： G03F7/40
- IPC分类号： G03F7/40 ; G03F7/20 ; H01L29/02
摘要：
Provided is a method of forming a pattern, including (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, (c) developing the exposed film with a developer containing an organic solvent, and (d) rinsing the developed film with a rinse liquid containing an organic solvent, which rinse liquid has a specific gravity larger than that of the developer.
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