Invention Application
US20130128247A1 Level Sensor, a Method for Determining a Height Map of a Substrate, and a Lithographic Apparatus
有权
液位传感器,确定基板的高度图的方法和平版印刷设备
- Patent Title: Level Sensor, a Method for Determining a Height Map of a Substrate, and a Lithographic Apparatus
- Patent Title (中): 液位传感器,确定基板的高度图的方法和平版印刷设备
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Application No.: US13679898Application Date: 2012-11-16
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Publication No.: US20130128247A1Publication Date: 2013-05-23
- Inventor: Laurent KHUAT DUY , Martinus Cornelis REIJNEN , Lukasz Jerzy MACHT , Erik Johan KOOP
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Main IPC: G01B11/00
- IPC: G01B11/00 ; G03B27/34

Abstract:
The invention provides a level sensor configured to determine a height level of a surface of a substrate, comprising a detection unit arranged to receive a measurement beam after reflection on the substrate, wherein the detection unit comprises an array of detection elements, wherein each detection element is arranged to receive a part of the measurement beam reflected on a measurement subarea of the measurement area, and is configured to provide a measurement signal based on the part of the measurement beam received by the respective detection element, and wherein the processing unit is configured to calculate, in dependence of a selected resolution at the measurement subarea, a height level of the measurement subarea, or to calculate a height level of a combination of multiple measurement subareas.
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