公开(公告)号：US20180210351A1

公开(公告)日：2018-07-26

申请号：US15743661

申请日：2016-07-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Rene Marinus Gerardus Johan QUEENS ,  Erik Johan KOOP ,  Reiner Maria JUNGBLUT

IPC: G03F9/00 ,  G03F7/20

CPC classification number: G03F9/7026 ,  G03F7/70616 ,  G03F9/7034 ,  G03F9/7046 ,  G03F9/7049

Abstract: A lithographic apparatus applies a device pattern at multiple fields across a substrate. A height map is decomposed into a plurality of components. A first height map component represents topographical variations associated with the device pattern. One or more further height map components represent other topographical variations. Using each height map component, control set-points are calculated according to a control algorithm specific to each component. The control set-points calculated for the different height map components are then combined and used to control imaging of the device pattern to the substrate. The specific control algorithms can be different from one another, and may have differing degrees of nonlinearity. The combining of the different set-points can be linear. Focus control in the presence of device-specific topography and other local variations can be improved.

公开(公告)号：US20130128247A1

公开(公告)日：2013-05-23

申请号：US13679898

申请日：2012-11-16

Applicant: ASML Netherlands B.V.

Inventor： Laurent KHUAT DUY ,  Martinus Cornelis REIJNEN ,  Lukasz Jerzy MACHT ,  Erik Johan KOOP

IPC: G01B11/00 ,  G03B27/34

CPC classification number: G01B11/00 ,  G01B11/0608 ,  G03B27/34 ,  G03F9/7034

Abstract: The invention provides a level sensor configured to determine a height level of a surface of a substrate, comprising a detection unit arranged to receive a measurement beam after reflection on the substrate, wherein the detection unit comprises an array of detection elements, wherein each detection element is arranged to receive a part of the measurement beam reflected on a measurement subarea of the measurement area, and is configured to provide a measurement signal based on the part of the measurement beam received by the respective detection element, and wherein the processing unit is configured to calculate, in dependence of a selected resolution at the measurement subarea, a height level of the measurement subarea, or to calculate a height level of a combination of multiple measurement subareas.

Abstract translation: 本发明提供了一种水平传感器，其被配置为确定衬底的表面的高度水平，包括检测单元，其布置成在衬底上反射之后接收测量光束，其中检测单元包括检测元件阵列，其中每个检测元件 被配置为接收在测量区域的测量子区域上反射的测量光束的一部分，并且被配置为基于由各个检测元件接收的测量光束的一部分来提供测量信号，并且其中，配置处理单元 根据测量子区域中的选定分辨率计算测量子区域的高度水平，或计算多个测量子区域的组合的高度水平。