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发明申请
US20130182264A1 Projection Exposure Tool for Microlithography and Method for Microlithographic Exposure 审中-公开
用于微光刻的投影曝光工具和微光刻曝光方法

Projection Exposure Tool for Microlithography and Method for Microlithographic Exposure
摘要：
A projection exposure tool for microlithography for exposing a substrate is disclosed. The tool includes a projection objective. The tool also includes an optical measuring apparatus for determining a surface topography of the substrate before the substrate is exposed. The measuring apparatus has a measuring beam path which extends outside of the projection objective. The measuring apparatus is a wavefront measuring apparatus configured to determine topography measurement values simultaneously at a number of points on the substrate surface.
摘要（中）：

公开了一种用于曝光衬底的用于微光刻的投影曝光工具。 该工具包括投影物镜。 该工具还包括用于在衬底暴露之前确定衬底的表面形貌的光学测量装置。 测量装置具有延伸到投影物镜外部的测量光束路径。 所述测量装置是波面测量装置，其被配置为在所述基板表面上的多个点处同时确定地形测量值。

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