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    Projection Exposure Tool for Microlithography and Method for Microlithographic Exposure
    1.
    发明申请
    Projection Exposure Tool for Microlithography and Method for Microlithographic Exposure 审中-公开
    用于微光刻的投影曝光工具和微光刻曝光方法

    公开(公告)号：US20130182264A1

    公开(公告)日：2013-07-18

    申请号：US13788042

    申请日：2013-03-07

    申请人： Jochen Hetzler ,  Sascha Bleidistel ,  Toralf Gruner ,  Joachim Hartjes

    发明人： Jochen Hetzler ,  Sascha Bleidistel ,  Toralf Gruner ,  Joachim Hartjes

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70133 ,  G03F7/70608 ,  G03F7/70733 ,  G03F9/7003 ,  G03F9/7034 ,  G03F9/7049

    摘要： A projection exposure tool for microlithography for exposing a substrate is disclosed. The tool includes a projection objective. The tool also includes an optical measuring apparatus for determining a surface topography of the substrate before the substrate is exposed. The measuring apparatus has a measuring beam path which extends outside of the projection objective. The measuring apparatus is a wavefront measuring apparatus configured to determine topography measurement values simultaneously at a number of points on the substrate surface.

    摘要翻译： 公开了一种用于曝光衬底的用于微光刻的投影曝光工具。 该工具包括投影物镜。 该工具还包括用于在衬底暴露之前确定衬底的表面形貌的光学测量装置。 测量装置具有延伸到投影物镜外部的测量光束路径。 所述测量装置是波面测量装置，其被配置为在所述基板表面上的多个点处同时确定地形测量值。

    Method for Improving the Imaging Properties of a Projection Objective, and Such a Projection Objective
    4.
    发明申请
    Method for Improving the Imaging Properties of a Projection Objective, and Such a Projection Objective 有权
    改进投影目标成像特性的方法，以及这样的投影目标

    公开(公告)号：US20080310029A1

    公开(公告)日：2008-12-18

    申请号：US11915191

    申请日：2006-05-24

    申请人： Olaf Conradi ,  Heiko Feldmann ,  Gerald Richter ,  Sascha Bleidistel ,  Andreas Frommeyer ,  Toralf Gruner ,  Wolfgang Hummel

    发明人： Olaf Conradi ,  Heiko Feldmann ,  Gerald Richter ,  Sascha Bleidistel ,  Andreas Frommeyer ,  Toralf Gruner ,  Wolfgang Hummel

    IPC分类号： G02B17/08 ,  G02B27/18

    CPC分类号： G02B27/0068 ,  G02B3/0081 ,  G02B26/0825 ,  G03F7/7015 ,  G03F7/70266 ,  G03F7/70558 ,  Y10S359/90

    摘要： The invention relates to a method -for improving the imaging properties of a micro lithography projection objective (50), wherein the projection objective has a plurality of lenses (L1, L2, L3, L4, L5, L6, L7, L8) between an object plane and an image plane, a first lens of the plurality of lenses being assigned a first manipulator (ml, Mn) for actively deforming the lens, the first lens being deformed for at least partially correcting an aberration, at least one second lens of the plurality of lenses furthermore being assigned at least one second manipulator, and the second lens being deformed in addition to the first lens. Furthermore, a method is described for selecting at least one lens of a plurality of lenses of a projection objective as actively deformable element, and a projection objective.

    摘要翻译： 本发明涉及一种用于改善微光刻投影物镜（50）的成像特性的方法，其中投影物镜在物体之间具有多个透镜（L1，L2，L3，L4，L5，L6，L7，L8） 平面和图像平面，多个透镜的第一透镜被分配用于主动变形透镜的第一操纵器（ml，Mn），第一透镜被变形以至少部分地校正像差，至少一个第二透镜 多个透镜还被分配至少一个第二操纵器，并且第二透镜除了第一透镜之外也变形。 此外，描述了用于选择投影物镜的多个透镜中的至少一个透镜作为主动变形元件和投影物镜的方法。

    CATADIOPTRIC PROJECTION OBJECTIVE INCLUDING A REFLECTIVE OPTICAL COMPONENT AND A MEASURING DEVICE
    6.
    发明申请
    CATADIOPTRIC PROJECTION OBJECTIVE INCLUDING A REFLECTIVE OPTICAL COMPONENT AND A MEASURING DEVICE 审中-公开
    反射光学元件和测量装置的目标投影目标

    公开(公告)号：US20120218536A1

    公开(公告)日：2012-08-30

    申请号：US13423344

    申请日：2012-03-19

    申请人： Sascha Bleidistel ,  Toralf Gruner ,  Christoph Zaczek ,  Ralf Mueller

    发明人： Sascha Bleidistel ,  Toralf Gruner ,  Christoph Zaczek ,  Ralf Mueller

    IPC分类号： G03B27/42

    CPC分类号： G03F7/70258 ,  G02B13/143 ,  G02B17/0856 ,  G02B17/0892 ,  G03F7/70225 ,  G03F7/706

    摘要： A catadioptric projection objective for images an object field onto an image field via imaging radiation. The projection objective includes at least one reflective optical component and a measuring device. The reflective optical component, during the operation of the projection objective, reflects a first part of the imaging radiation and transmits a second part of the imaging radiation. The reflected, first part of the imaging radiation at least partly contributes to the imaging of the object field. The transmitted, second part of the imaging radiation is at least partly fed to a measuring device. This allows a simultaneous exposure of the photosensitive layer at the location of the image field with the imaging radiation and monitoring of the imaging radiation with the aid of the measuring device.

    摘要翻译： 用于通过成像辐射将物体场映射到图像场上的反射折射投影物镜。 投影物镜包括至少一个反射光学部件和测量装置。 在投影物镜的操作期间，反射光学部件反射成像辐射的第一部分并透射成像辐射的第二部分。 成像辐射的反射的第一部分至少部分地有助于对象场的成像。 成像辐射的透射的第二部分至少部分地被馈送到测量装置。 这允许在成像辐射的图像位置处的感光层同时曝光并借助测量装置监测成像辐射。