发明申请
US20130186337A1 SUBSTRATE PROCESSING DEVICE FOR SUPPLYING REACTION GAS THROUGH SYMMETRY-TYPE INLET AND OUTLET
审中-公开
用于通过对称型入口和出口提供反应气的基板处理装置
- 专利标题： SUBSTRATE PROCESSING DEVICE FOR SUPPLYING REACTION GAS THROUGH SYMMETRY-TYPE INLET AND OUTLET
- 专利标题（中）： 用于通过对称型入口和出口提供反应气的基板处理装置
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申请号： US13822121申请日： 2011-10-06
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公开(公告)号： US20130186337A1公开(公告)日： 2013-07-25
- 发明人: Sung Tae Je , Il Kwang Yang , Byung Gyu Song , Song Hwan Park
- 申请人： Sung Tae Je , Il Kwang Yang , Byung Gyu Song , Song Hwan Park
- 申请人地址： JP Gyeonggi-do
- 专利权人： EUGENE TECHNOLOGY CO., LTD.
- 当前专利权人： EUGENE TECHNOLOGY CO., LTD.
- 当前专利权人地址： JP Gyeonggi-do
- 优先权： KR10-2010-0097151 20101006
- 国际申请： PCT/KR2011/007400 WO 20111006
- 主分类号： H01L21/02
- IPC分类号： H01L21/02
摘要：
Provided is a substrate processing apparatus. The substrate processing apparatus includes a chamber where processes with respect to a substrate are carried out, a substrate support on which the substrate is placed, the substrate support being disposed within the chamber, and a showerhead in which an inlet for supplying reaction gas into the chamber and an outlet for discharging the reaction gas supplied into the chamber are symmetrically disposed. The reaction gas flows within the chamber in a direction roughly parallel to that of the substrate.
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