发明申请
US20130186852A1 DEVICE AND METHOD FOR PRODUCING TARGETED FLOW AND CURRENT DENSITY PATTERNS IN A CHEMICAL AND/OR ELECTROLYTIC SURFACE TREATMENT
有权
在化学和/或电泳表面处理中生产目标流动和电流密度模式的装置和方法
- 专利标题: DEVICE AND METHOD FOR PRODUCING TARGETED FLOW AND CURRENT DENSITY PATTERNS IN A CHEMICAL AND/OR ELECTROLYTIC SURFACE TREATMENT
- 专利标题(中): 在化学和/或电泳表面处理中生产目标流动和电流密度模式的装置和方法
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申请号: US13812975申请日: 2011-07-29
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公开(公告)号: US20130186852A1公开(公告)日: 2013-07-25
- 发明人: Lothar Dietrich , Ralf Schmidt , Andreas Ostmann
- 申请人: Lothar Dietrich , Ralf Schmidt , Andreas Ostmann
- 申请人地址: DE München
- 专利权人: Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V.
- 当前专利权人: Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V.
- 当前专利权人地址: DE München
- 优先权: DE102010033256.9 20100729
- 国际申请: PCT/EP11/03859 WO 20110729
- 主分类号: F17D3/00
- IPC分类号: F17D3/00 ; H01L21/02
摘要:
The invention relates to a device and method for producing targeted flow and current density patterns in a chemical and/or electrolytic surface treatment. The device comprises a flow distributor body which is disposed, with the front face thereof, plane-parallel to a substrate to be processed, and which has outlet openings on the front face, through which process solution flows onto the substrate surface. The process solution flowing back from the substrate is led off through connecting passages onto the rear face of the flow distributor body. At the same time a targeted distribution of an electrical field on a conductive substrate surface is effected by a specific arrangement of said connecting passages.
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