发明申请
- 专利标题: ACOUSTIC WAVE ELEMENT AND ACOUSTIC WAVE DEVICE USING SAME
- 专利标题(中): 声波元件和声波设备使用相同
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申请号: US13878116申请日: 2011-12-22
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公开(公告)号: US20130207747A1公开(公告)日: 2013-08-15
- 发明人: Junya Nishii , Tetsuya Kishino , Hiroyuki Tanaka , Kyohei Kobayashi , Kenji Yamamoto , Masahisa Shimozono , Takanori Ikuta , Michiaki Nishimura
- 申请人: Junya Nishii , Tetsuya Kishino , Hiroyuki Tanaka , Kyohei Kobayashi , Kenji Yamamoto , Masahisa Shimozono , Takanori Ikuta , Michiaki Nishimura
- 申请人地址: JP Kyoto-shi, Kyoto
- 专利权人: KYOCERA CORPORATION
- 当前专利权人: KYOCERA CORPORATION
- 当前专利权人地址: JP Kyoto-shi, Kyoto
- 优先权: JP2010-294051 20101228; JP2011-121628 20110531
- 国际申请: PCT/JP2011/079865 WO 20111222
- 主分类号: H03H9/25
- IPC分类号: H03H9/25 ; H03H9/64
摘要:
A SAW element has a substrate; an IDT electrode located on an upper surface of the substrate and comprises Al or an alloy containing Al; a first film located on an upper surface of the IDT electrode; and a protective layer which covers the IDT electrode provided with the first film and the portion of the substrate exposed from the IDT electrode, which has a thickness from the upper surface of the substrate larger than a total thickness of the IDT electrode and first film, and which contains a silicon oxide. The first film contains a material which has a larger acoustic impedance than the material (Al or the alloy containing Al) of the IDT electrode and the silicon oxide and which has a slower propagation velocity of an acoustic wave than the material of the IDT electrode and the silicon oxide.
公开/授权文献
- US09503049B2 Acoustic wave element and acoustic wave device using same 公开/授权日:2016-11-22
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