发明申请
- 专利标题: MONOLAYER OR MULTILAYER FORMING COMPOSITION
- 专利标题(中): 单层或多层成型组合物
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申请号: US13879125申请日: 2011-10-07
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公开(公告)号: US20130216956A1公开(公告)日: 2013-08-22
- 发明人: Takahiro Kishioka , Daisuke Sakuma , Shigeo Kimura , Hirokazu Nishimaki , Tomoya Ohashi , Yuki Usui
- 申请人: Takahiro Kishioka , Daisuke Sakuma , Shigeo Kimura , Hirokazu Nishimaki , Tomoya Ohashi , Yuki Usui
- 申请人地址: JP Tokyo
- 专利权人: NISSAN CHEMICAL INDUSTRIES, LTD.
- 当前专利权人: NISSAN CHEMICAL INDUSTRIES, LTD.
- 当前专利权人地址: JP Tokyo
- 优先权: JP2010-231796 20101014
- 国际申请: PCT/JP2011/073239 WO 20111007
- 主分类号: G03F7/075
- IPC分类号: G03F7/075 ; G03F7/20
摘要:
There is provided a composition for forming a monolayer or a multilayer on the substrate. A composition for forming a monolayer or a multilayer containing a silane compound of Formula (1A) or Formula (1B): [where R1s are independently a methyl group or an ethyl group; Xs are independently a C1-10 linking group; and Zs are independently a C1-10 alkyl group or a phenyl group optionally having a substituent, where X optionally contains at least one oxygen atom or sulfur atom in the main chain thereof, and when Z is an alkyl group, at least one hydrogen atom of the alkyl group is optionally substituted with a fluorine atom] and an organic solvent.
公开/授权文献
- US09023583B2 Monolayer or multilayer forming composition 公开/授权日:2015-05-05
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