Invention Application
- Patent Title: Soft Magnetic Alloy for Magnetic Recording Medium, Sputtering Target Material, and Magnetic Recording Medium
- Patent Title (中): 用于磁记录介质的软磁合金,溅射靶材料和磁记录介质
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Application No.: US13817645Application Date: 2011-08-19
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Publication No.: US20130224067A1Publication Date: 2013-08-29
- Inventor: Toshiyuki Sawada , Hiroyuki Hasegawa , Atsushi Kishida
- Applicant: Toshiyuki Sawada , Hiroyuki Hasegawa , Atsushi Kishida
- Applicant Address: JP Himeji-shi, Hyogo-ken
- Assignee: SANYO SPECIAL STEEL CO., LTD.
- Current Assignee: SANYO SPECIAL STEEL CO., LTD.
- Current Assignee Address: JP Himeji-shi, Hyogo-ken
- Priority: JP2010-186876 20100824
- International Application: PCT/JP2011/068790 WO 20110819
- Main IPC: G11B5/65
- IPC: G11B5/65 ; C23C14/34

Abstract:
There is provided a soft magnetic alloy for a perpendicular magnetic recording medium having a low coercive force, high amorphous properties, high corrosion resistance, and a high hardness; and a sputtering target for producing a thin film of the alloy. The alloy comprises in at. %: 6 to 20% in total of one or two of Zr and Hf; 1 to 20% of B; and 0 to 7% in total of one or two or more of Ti, V, Nb, Ta, Cr, Mo, W, Ni, Al, Si, and P; and the balance Co and/or Fe and unavoidable impurities. The alloy further satisfies 6≦2×(Zr%+Hf%)−B%≦16 and 0≦Fe%/(Fe%+Co%)
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