发明申请
US20130224652A1 METAL PEROXO COMPOUNDS WITH ORGANIC CO-LIGANDS FOR ELECTRON BEAM, DEEP UV AND EXTREME UV PHOTORESIST APPLICATIONS
有权
具有电子束有机配体的金属过氧化合物，深紫外线和超紫外线光刻胶应用
- 专利标题： METAL PEROXO COMPOUNDS WITH ORGANIC CO-LIGANDS FOR ELECTRON BEAM, DEEP UV AND EXTREME UV PHOTORESIST APPLICATIONS
- 专利标题（中）： 具有电子束有机配体的金属过氧化合物，深紫外线和超紫外线光刻胶应用
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申请号： US13405587申请日： 2012-02-27
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公开(公告)号： US20130224652A1公开(公告)日： 2013-08-29
- 发明人: John David Bass , Ho-Cheol Kim , Robert Dennis Miller , Qing Song , Linda Karin Sundberg , Gregory Michael Wallraff
- 申请人： John David Bass , Ho-Cheol Kim , Robert Dennis Miller , Qing Song , Linda Karin Sundberg , Gregory Michael Wallraff
- 申请人地址： US NY Armonk
- 专利权人： INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人： INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人地址： US NY Armonk
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; C07F9/00 ; C07F7/28 ; G03F7/004
摘要：
Compositions are disclosed having the formula (3): [C′]k[Ta(O2)x(L′)y] (3), wherein x is an integer of 1 to 4, y is an integer of 1 to 4, Ta(O2)x(L′)y has a charge of 0 to −3, C′ is a counterion having a charge of +1 to +3, k is an integer of 0 to 3, L′ is an oxidatively stable organic ligand having a charge of 0 to −4, and L′ comprises an electron donating functional group selected from the group consisting of carboxylates, alkoxides, amines, amine oxides, phosphines, phosphine oxides, arsine oxides, and combinations thereof. The compositions have utility as high resolution photoresists.
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